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Hydrogen On Semiconductor Surfaces

Published online by Cambridge University Press:  10 February 2011

J. A. Schaefer ,
T. Balster ,
V. Polyakov ,
U. Rossow ,
S. Sloboshanin ,
U. Starke  and
F. S. Tautz
J. A. Schaefer
Affiliation:
Institut für Physik, Technische Universität Ilmenau, PO 10 05 65, D-98684 Ilmenau, Germany, tphys@physik.tu-ilmenau.de
T. Balster
Affiliation:
Institut für Physik, Technische Universität Ilmenau, PO 10 05 65, D-98684 Ilmenau, Germany, tphys@physik.tu-ilmenau.de
V. Polyakov
Affiliation:
Institut für Physik, Technische Universität Ilmenau, PO 10 05 65, D-98684 Ilmenau, Germany, tphys@physik.tu-ilmenau.de
U. Rossow
Affiliation:
Institut für Physik, Technische Universität Ilmenau, PO 10 05 65, D-98684 Ilmenau, Germany, tphys@physik.tu-ilmenau.de
S. Sloboshanin
Affiliation:
Institut für Physik, Technische Universität Ilmenau, PO 10 05 65, D-98684 Ilmenau, Germany, tphys@physik.tu-ilmenau.de
U. Starke
Affiliation:
Institut für Physik, Technische Universität Ilmenau, PO 10 05 65, D-98684 Ilmenau, Germany, tphys@physik.tu-ilmenau.de
F. S. Tautz
Affiliation:
Institut für Physik, Technische Universität Ilmenau, PO 10 05 65, D-98684 Ilmenau, Germany, tphys@physik.tu-ilmenau.de
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Abstract

We review structural and electronic aspects of the reaction of hydrogen with semiconductor surfaces. Among others, we address the Si(100), GexSi1-x(100), GaAs(100), InP(100), SiC(100), SiC(0001) and SiC(0001) surfaces. It is demonstrated that high resolution electron energy loss spectroscopy (HREELS) in conjunction with a number of other surface sensitive techniques like low energy electron diffraction (LEED) and photoelectron spectroscopy (XPS/UPS) can yield important information about the surface atomic structure, the effects of hydrogen passivation and etching and on electronic properties of the surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 513: Symposium H – Hydrogen in Semiconductors and Metals , 1998 , 3
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1. Hydrogen in Solids and at Solid Surfaces, eds Schaefer, J. A. and Stutzmann, M., phys. stat. sol. (a) 159 (1997)Google Scholar
2. Schaefer, J. A., Surf. Sci. 189/190, 127 (1987)Google Scholar
3. Schaefer, J. A., Appl. Phys. A 51, 305 (1990).Google Scholar
4. Schaefer, J. A., Physica B 170, 45 (1991).Google Scholar
5. Ibach, H. and Mills, D. L., Electron Energy Loss Spectroscopy and Surface Vibrations (Academic Press, New York, 1982).Google Scholar
6. Stucki, F., Schaefer, J. A., Anderson, J. R., Lapeyre, G. J., and Göpel, W., Solid State Comm., 47, 797 (1983).Google Scholar
7. Schaefer, J. A., Stucki, F., Anderson, J. R., Lapeyre, G. J., and Güpel, W., Surf. Sci. 160, 207 (1984).Google Scholar
8. Tautz, F. S., Schaefer, J. A.; to be publishedGoogle Scholar
9. Balster, T., Tautz, F. S, Ibach, H., and Schaefer, J. A., Diamond and Related Materials 6, 1353–57 (1997)Google Scholar
10. Balster, T., Polyakov, V. M., Ibach, H., and Schaefer, J. A., to be published.Google Scholar
11. Polyakov, V., Elbe, A., and Schaefer, J. A., Appl. Phys. A 60, 567 (1995).Google Scholar
12. Polyakov, V. M., Elbe, A., Wu, J., Lapeyre, G. J., and Schaefer, J. A., Phys. Rev. B 54, 2010 (1996)Google Scholar
13. Polyakov, V. M., Elbe, A., Schaefer, J. A., phys. stat. sol. (a) 159, 195 (1997)Google Scholar
14. Epioptics - Linear and Nonlinear Optical Spectroscopy of Surfaces and Interfaces, edited by McGilp, J. F., Weaire, D., and Patterson, C. H., (Springer Berlin, Heidelberg, 1995).Google Scholar
15. Optical Characterization of Epitaxial Semiconductor Layers, edited by Bauer, G., Richter, W., (Springer Berlin Heidelberg, 1996).Google Scholar
16. Kelly, M. K., Zollner, S., Cardona, M., Surf. Sci. 285, 282 (1993).Google Scholar
17. Rossow, U., Frotscher, U., Richter, W., and Zahn, D. R. T., Surf. Sci. 287/288, 718 (1993).Google Scholar
18. Esser, N., Richter, W., in Light Scattering in Solids VII, edited by Cardona, M., Güntherodt, G., (Springer Berlin Heidelberg, 1998).Google Scholar
19. Rossow, U., Mantese, L., Frotscher, U., Aspnes, D. E., Richter, W., Mat. Res. Soc. Symp. Proc. 406, 371 (1996).Google Scholar
20. Boland, J.; Adv. in Physics 42, 129 (1993)Google Scholar
21. Münch, W., phys. stat. sol. (a) 159, 25 (1997).Google Scholar
22. Lüth, H., Vacuum, 38, 233 (1988)Google Scholar
23. Chabal, Y. J.; Surf. Sci. Rep. 8, 211 (1988), Y.J. Chabal; Physica B 170, 447 (1991)Google Scholar
24. Chabal, Y. J., Hines, M. A., Feijoo, D.; J. Vac. Sci. Technol. A 13, 1719 (1995)Google Scholar
25. Tully, J. C., Chabal, Y. J., Raghavachari, K., Bowman, J. M., Lucchese, R. R.: Phys. Rev. B 31, 1184 (1985)Google Scholar
26. Guyot-Sionnest, P., Dumas, P., Chabal, Y. J.; J. Electr. Spec. Rel. Phenom. 54/55, 27 (1990)Google Scholar
27. Angot, T., Bolmont, D., Koulmann, J. J.; Surf. Sci. 352–354, 401 (1996)Google Scholar
28. Dumas, P., Chabal, Y. J., Jakob, P.; Surf. Sci. 269/270, 867 (1992)Google Scholar
29. Cheng, C. C.. Yates, J. T.; Phys. Rev. B 43, 4041 (1991)Google Scholar
30. Hess, G., Russel, M., Gong, B., Parkinson, P., Ekerdt, J. G., J. Vac. Sci Technol. A 15, 1129–1134 (1997)Google Scholar
31. Crowell, J. E., Lu, G., J. Electr. Spectrosc. Rel. Phenom. 54/55, 1045 (1990)Google Scholar
32. Crowell, J. E., Lu, G., Ning, B. N. H.; Mater. Res. Soc. Symp. Proc. 204, 253 (1991)Google Scholar
33. Shimanouchi, T., J. Phys. Chem. Ref. Data 6, 993 (1977)Google Scholar
34. Pollard, W. B., Lucovsky, G.; Phys. Rev. B 26, 3172 (1982)Google Scholar
35. Schaefer, J. A., Broughton, J. Q., Bean, J. C., and Farrell, H. H., Phys. Rev. B 33, 2999 (1986).Google Scholar
36. Schaefer, J. A., Broughton, J. Q., Bean, J. C., and Farrell, H. H., J. Electr.. Spectrosc. Rel. Phenom. 39, 127 (1986).Google Scholar
37. Allinger, Th.,Schaefer, J. A., Stuhlmann, C., Beckers, U., and lbach, H., Physica B 170, 481 (1991).Google Scholar
38. Schaefer, J. A., Trends in Vacuum Sci. and Technol. 1, 417 (1993).Google Scholar
39. Schaefer, J. A., Stietz, F., Woll, J., Wu, H. S., Yu, H., Lapeyre, G. J., J. Vac. Sci. Technol. B 11, 1497 (1993)Google Scholar
40. Stietz, F., Allinger, Th., Polyakov, V. M., Woll, J., Goldmann, A., Erfurth, W., Lapeyre, G. J., and Schaefer, J. A.,Appl. Surf. Sci. 104/105, 169 (1996)Google Scholar
41. Stietz, F., Woll, J., Persch, V., Allinger, Th., Erfurth, W., Goldmann, A. and Schaefer, J. A., phys. stat. sol. (a) 159,185 1997).Google Scholar
42. Schardt, J., Bram, Ch., Müller, S., Starke, U., Heinz, K., and Müller, K., Surf. Sci. 337, 232 (1995).Google Scholar
43. Starke, U., phys. stat. sol. (b) 202, 475 (1997).Google Scholar
44. Starke, U., Schardt, J., Franke, M., Applied Physics A 65, 587 (1997).Google Scholar
45. Starke, U., Bernhardt, J., Franke, M., Schardt, J., and Heinz, K., Diamond and Rel. Mat. 6, 1349 (1997).Google Scholar
46. Schardt, J., Bernhardt, J., Starke, U. and Heinz, K., Surf. Rev. Lett. 5, 181 (1998).Google Scholar
47. Schardt, J., Bernhardt, J., Franke, M., Starke, U., and Heinz, K., in: Materials Science Forum, 264–266, eds. Pensl, G., Morcoç, H., Monemar, B., Janzén, E. (Trans Tech Publications, Zürich, 1998), p. 343.Google Scholar
48. Hollering, M., Bernhardt, J., Schardt, J., Ziegler, A., Graupner, R., Mattem, B., Stampfl, A. P. J., Starke, U., Heinz, K., and Ley, L., Phys. Rev. B, accepted.Google Scholar
49. Sabisch, M., Krüger, P., Mazur, A., and Pollmann, J., Surf. Rev. Letm., in press.Google Scholar
50. Sabisch, M., Krüger, P., Pollmann, J., Phys. Rev. B 55, 10561 (1997).Google Scholar
51. Starke, U., Bram, Ch., Steiner, P. R., Hartner, W., Hammer, L., Heinz, K., Müller, K., Appl. Surf. Sci. 89, 175 (1995).Google Scholar
52. Powers, J. M., Wander, A., Rous, P. J., Van Hove, M. A. and Somorjai, G. A., Phys. Rev. B 40, 11159 (1991).Google Scholar
53. Powers, J. M., Wander, A., Van Hove, M. A., Somorjai, G. A., Surf. Sci. 260, L7 (1992).Google Scholar
54. Parrill, T. M., Chung, Y. W., Surf. Sci. 243, 96 (1991).Google Scholar
55. Tautz, F. S., Sloboshanin, S., Hohenecker, S., Zahn, D. R. T., J.A. Schaefer; Appl. Surf. Sci. 123/124, 17 (1998).Google Scholar
56. Balster, T., Polyakov, V. M., Tautz, F. S., Ibach, H. and Schaefer, J. A., Mat. Res. For., 264–268, 347 (1998).Google Scholar
57. Pearton, S. J., Dautremont-Smith, W. C., Chevallier, J., Tu, C. W., and Cummings, K. D., J. Appl. Phys. 59, 2821 (1986).Google Scholar
58. Jalil, A., Chevallier, J., Azoulay, R., and Mircea, A., J. Appl. Phys. 59, 3774 (1986).Google Scholar
59. Pajot, B., Newman, R. C., Murray, R., Jalil, A., Chevallier, J., and Azoulay, R., Phys. Rev. B 37, 4188 (1988).Google Scholar
60. Theys, B., Machayekhi, B., Chevallier, J., Somogyi, K., Zahraman, K., Gibart, P., and Miloche, M., J. Appl. Phys. 77, 3186 (1995).Google Scholar
61. Pavesi, L., Giannozzi, P., and Reinhart, F. K., Phys. Rev. B 42, 1864 (1990); L. Pavesi, P. Giannozzi, Phys. Rev. B 43, 2446 (1991); L. Pavesi, P. Giannozzi, Phys. Rev. B 46, 4621 (1992).Google Scholar
62. Chang, K. J., Solid State Commun. 78, 273 (1991).Google Scholar
63. Briddon, P. R., and Jones, R., Phys. Rev. Lett. 64, 2535 (1990).Google Scholar
64. Kilday, D. G., Margaritondo, G., and Lapeyre, G. J, J. Vac. Sci. Technol. A 8, 2755 (1990); Y. Chen, S. Nannarone, J.A. Schaefer, J.C. Hermanson, and G.J. Lapeyre, Phys. Rev. B 29, 7653 (1989); Y. Chen, J.C. Hermanson, and G.J. Lapeyre, Phys. Rev. B 39, 12682 (1989).Google Scholar
65. Bermudez, V. M., Long, J. P.; Appl. Phys. Lett. 66, 475 (1994).Google Scholar
66. Powers, J. M., Wander, A., Rous, P. J., Van Hove, M. A. and Somorjai, G. A., Phys. Rev. B 40, 11159 (1991).Google Scholar
67. Bermudez, V. M, phys. stat.sol (b) 202, 447 (1997)Google Scholar