Hostname: page-component-848d4c4894-nr4z6 Total loading time: 0 Render date: 2024-05-11T11:13:11.753Z Has data issue: false hasContentIssue false

High Resolution Study of CoSi2/Si (111) Interfaces

Published online by Cambridge University Press:  21 February 2011

A. Catana
Affiliation:
Institute of Applied Physics, Swiss Federal Institute of Technology 1015 Lausanne, Switzerland
Ping Lu
Affiliation:
Institute of Applied Physics, Swiss Federal Institute of Technology 1015 Lausanne, Switzerland
David J. Smith
Affiliation:
Center for Solid State Science and Department of Physics, Arizona State University, Tempe, AZ 85287, USA
Get access

Abstract

The atomic structure of A- and B-type CoSi2/Si (111) interfaces has been investigated by observations of samples in cross-section using a 400 kV high-resolution electron microscope. The samples were prepared by UHV e–beam evaporation of Co layers followed by annealing at temperatures between 300°C and 500°C. Based upon image simulations for various interface bonding models we have found evidence for 7–fold Co coordination at the A–type CoSi2/Si interfaces and for 7– and 8–fold coordination at the B-type interfaces.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Hamann, D.R., Phys. Rev. Lett. 60, 313 (1988)Google Scholar
[2] van den Hoek, P.J., Ravenek, W. and Barends, E.J., Phys. Rev. Lett. 60 1743 (1988)Google Scholar
[3] Fisher, A.E.M.J., Vlieg, E., van der Veen, J.F., Clausnitzer, M. and Materlik, G., Phys. Rev. B36, 4769 (1987)Google Scholar
[4] Fisher, A.E.M.J., Gustafsson, T. and Van der Veen, J.F., Phys. Rev. B37, 6305 (1988)Google Scholar
[5] Rossi, G., Jin, X., Santaniello, A., DePadova, P. and Chandesris, D., Phys. Rev. Lett. 62, 191 (1989)Google Scholar
[6] Gibson, J.M., Bean, J.C., Poate, J.M. and Tung, R.T., Appl. Phys. Lett. 41, 818 (1982)Google Scholar
[7] Bulle-Lieuwma, C.W.T., de Jong, A.F., van Ommen, A.H., van der Veen, J.F. and Vrijmoeth, J., Appl. Phys. Lett.,to be publishedGoogle Scholar
[8] de Jong, A.F. and Bulle-Lieuwma, C.W.T., Phil.Mag. A, to be publishedGoogle Scholar
[9] Catana, A., Schmid, P.E., Rieubland, S., Levy, F. and Stadelmann, P., J.Phys. Condens. Matter 1, 3999 (1989)Google Scholar
[10] Catana, A., Heintze, M., Schmid, P.E. and Stadelmann, P., MRS Proceedings, Fall Meeting (1989) to be publishedGoogle Scholar
[11] Comin, F. and Citrin, P.H., Stanford Sychrotron Radiation Laboratory Activity Report 115 (1985)Google Scholar
[12] Bulle-Lieuwma, C.W.T., van Ommen, A.H. and Ijzendoorn, L.J., Appl. Phys. Lett. 54, 244 (1989)Google Scholar
[13] Stadelmann, P., Ultramicroscopy 21, 131 (1987)Google Scholar
[14] Lau, S.S., Mayer, J.W. and Tu, K.N., J. Appl. Phys. 47, 4005 (1978)Google Scholar