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High Rate Deposition of Nickel Oxide Electrochromic Thin Films by Reactive DC Magnetron Sputtering

Published online by Cambridge University Press:  16 February 2011

Kazuki Yoshimura ,
T. Miki  and
S. Tanemura
Kazuki Yoshimura
Affiliation:
Multifunctional Material Science Department National Industrial Research Institute of Nagoya, Nagoya, 462, JAPAN
T. Miki
Affiliation:
Multifunctional Material Science Department National Industrial Research Institute of Nagoya, Nagoya, 462, JAPAN
S. Tanemura
Affiliation:
Multifunctional Material Science Department National Industrial Research Institute of Nagoya, Nagoya, 462, JAPAN
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Abstract

Nickel oxide electrochromic thin films were prepared by reactive DC magnetron sputtering. As-deposited optical property and electrochromic behavior strongly depended on the target operation mode and the substrate temperature. In the condition of low oxygen flow ratio (∼1%), the deposition rate can be raised up to 40 nm/min at the power of 60 W. The sample with the deposition rate of 30 nm/min exhibited the best electrochromic performance when the substrate temperature was kept to 200°C-300°C during sputtering. The integrated luminous transmittance of the best sample could be controlled from 6.6% to 82.3%.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 369: Symposium U – Solid State Ionics IV , 1994 , 663
Copyright
Copyright © Materials Research Society 1995

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