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Growth of MBE-Codeposited IrSi3 on Si(111) and Si(100)

Published online by Cambridge University Press:  15 February 2011

Gary A. Gibson ,
Davis A. Lange  and
Charles M. Falco
Gary A. Gibson
Affiliation:
Department of Physics, Optical Sciences Center, and Arizona Research Labs, University of Arizona, Tucson AZ 85721
Davis A. Lange
Affiliation:
Department of Physics, Optical Sciences Center, and Arizona Research Labs, University of Arizona, Tucson AZ 85721
Charles M. Falco
Affiliation:
Department of Physics, Optical Sciences Center, and Arizona Research Labs, University of Arizona, Tucson AZ 85721
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Abstract

We have used Molecular Beam Epitaxy (MBE) to successfully grow films that are predominantly IrSi3 on both Si(111) and Si(100) substrates by codeposition of Si and Ir in a 3:1 ratio. Bragg-Brentano and Seemann-Bohlin x-ray diffraction reveal that polycrystalline IrSi3 films form as low as 450 °C. This is the lowest temperature yet reported for growth of this iridium silicide phase. These x-ray diffraction techniques, along with Transmission Electron Microscope (TEM) diffraction and in situ Low Energy Electron Diffraction (LEED), show that at higher deposition temperatures codeposition can form IrSi3 films on Si(111) that consist predominantly of a single epitaxial growth orientation. Ion beam channeling and x-ray rocking curves show that the epitaxial quality of IrSi3 films deposited on Si(111) is superior to that of IrSi3 films deposited on Si(100). We also present evidence for several new epitaxial IrSi3 growth modes on Si(111) and Si(100).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 299: Symposium C2 – Infrared Detectors--Materials, Processing, and Devices , 1994 , 303
Copyright
Copyright © Materials Research Society 1994

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