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Grazing Incidence X-Ray Reflectometry Studies of Cadmium Arachidate Langmuir-Blodgett Films

Published online by Cambridge University Press:  21 February 2011

B. K. Tanner ,
D. K Bowen ,
M. C Petty ,
S. Swaminathan  and
F. Granfeld
B. K. Tanner
Affiliation:
Dept. of Physics, University of Durham, South Road, Durham, DH1 3LE, U.K.
D. K Bowen
Affiliation:
Dept. of Engineering, University of Warwick, Coventry, CV7 4AL, U.K.
M. C Petty
Affiliation:
School of Engineering and Computer Science, University of Durham, South Road Durham DH1 3LE, U.K.
S. Swaminathan
Affiliation:
Dept. of Engineering, University of Warwick, Coventry, CV7 4AL, U.K.
F. Granfeld
Affiliation:
NIMA Technology, University of Warwick Science Park, Coventry, U.K
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Abstract

Grazing incidence X-ray reflectometry has been used to characterize Langmuir-Blodgett films of cadmium arachidate deposited on silicon substrates. The agreement between layer parameters deduced from the interference fringe period and low angle Bragg peak positions was excellent. Good agreement was found between experimental and simulated reflectivity profiles only when interface roughness and a varying molecular layer thickness was included. Inclusion of interface roughness alone results in a substantial enhancement in the intensity of the Bragg peaks. This effect is identified as being equivalent to the reduction in extinction found in classical X-ray diffraction due to crystal imperfections.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 237: Symposium Ca – Interface Dynamics and Growth , 1991 , 281
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

1 Huang, TC, Adv. X-ray Analysis 35 (1992) in pressGoogle Scholar
2 Tanner, B K, Miles, S J, Bowen, D K, Hart, L and Loxley, N, Mat. Res. Soc. Symp. Proc. 208 345 (1991)Google Scholar
3 Kisker, DW, Fuoss, PH, Brennan, S, Renaud, G and Tokuda, KL, J Cryst. Growth 101 42(1990)CrossRefGoogle Scholar
4 von Kiessig, H., Ann Physik 10, 715 and 769 (1931)Google Scholar
5 Parrish, W, Erickson, C, Huang, T C, Hart, M, Gilles, B and Toraya, H, Mater. Res. Soc. Symp. Proc. 208 327 (1991)Google Scholar
6 Pomerantz, M, Thin Solid Films 152 165 (1987)Google Scholar
7 Jark, W, Cornelli, G, Russel, T P and Stohr, J, Thin Solid Films 170 309 (1989)CrossRefGoogle Scholar
8 Loxley, N, Monteiro, A, Cooke, M L, Bowen, D K and Tanner, B K, this conferenceGoogle Scholar
9 Wormington, M, Bowen, D K and Tanner, B K, this conferenceGoogle Scholar
10 Parratt, L G, Phys. Rev. 95 359 (1954)Google Scholar
11 Nevot, L and Croce, P, Rev. Phys. Appl. 15, 761 (1980)Google Scholar
12 Cowley, R A and Ryan, T W, J. Phys. D: Appl. Phys. 20 61 (1987)Google Scholar