Hostname: page-component-8448b6f56d-gtxcr Total loading time: 0 Render date: 2024-04-16T04:22:11.298Z Has data issue: false hasContentIssue false

Gas-Phase Generation of Nanometer-Sized Metal Particles for Fabrication of Zero-Dimensional Quantum Structures

Published online by Cambridge University Press:  22 February 2011

Tammy C. Pluym
Affiliation:
University of New Mexico, Center for Micro-Engineered Ceramics, Chemical Engineering Department, Albuquerque, NM 87131
T.T. Kodas
Affiliation:
University of New Mexico, Center for Micro-Engineered Ceramics, Chemical Engineering Department, Albuquerque, NM 87131
L.M. Wang
Affiliation:
University of New Mexico, Geology Department, Albuquerque, NM 87131
A. Wiedensohler
Affiliation:
University of Lund, Department of Nuclear Physics, Solvegatan 14, S-22362 Lund, Sweden
H.C. Hansson
Affiliation:
University of Lund, Department of Nuclear Physics, Solvegatan 14, S-22362 Lund, Sweden
L. Maximov
Affiliation:
University of Lund, Department of Solid State Physics, Solvegatan 14, S-22362 Lund, Sweden
L. Samuelson
Affiliation:
University of Lund, Department of Solid State Physics, Solvegatan 14, S-22362 Lund, Sweden
Get access

Abstract

Nanometer-sized particles of Mo, Ta, Nb, and Pd were formed by gas-phase reactions of metal halides and β-diketonates in the presence of hydrogen. Particle diameters ranged from 5-100 nm depending on the reaction temperature (500-950 βC) and precursor characteristics. Gasphase particle concentrations reached 108/cm3. These particles are suitable as etching masks on semiconductor substrates for generation of zero-dimensional quantum structures.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Wiedensohler, A., Hansson, H.C., Maximov, I., Samuelson, L., Appl. Phys. Lett. 61, 837 (1992).Google Scholar
2. Pluym, T.C., Powell, Q.H., Gurav, A.S., Ward, T.L., Kodas, T.T., Wang, L.M., Glicksman, H.D., J. Aerosol Sci., (In press).Google Scholar
3. Pluym, T.C., Lyons, S.W., Powell, Q.H., Gurav, A.S., Kodas, T.T., Wang, L.M., Glicksman, H.D., Mat. Res. Bull., (Accepted for publication).Google Scholar
4. Sugano, T., Chou, H.K., Yoshida, M., Nishi, T., Jap. J. Appl. Phys. 7, 1028 (1968).Google Scholar
5. Stolz, M., Hieber, K., Wieczorek, C., Thin Solid Films 100, 209 (1983).Google Scholar
6. Weiss, F., Madar, R., Senateur, J.P., Boursier, D., Bernard, C., Fruchart, R., J. Cryst. Growth 56, 423 (1982).Google Scholar
7. Rand, M.J., J. Electrochem. Soc. 120, 686 (1973).Google Scholar