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Formation of Buried Sio2 By High Dose Implantation of Oxygen at Room and Liquid Nitroeen Temperatures

Published online by Cambridge University Press:  28 February 2011

F. Namavar ,
J. I. Budnick ,
F. H. Sanchez  and
H. C. Hayden
F. Namavar
Affiliation:
Department of Physics and Institute of Materials Science, University of Connecticut, Storrs, CT, 06268.
J. I. Budnick
Affiliation:
Department of Physics and Institute of Materials Science, University of Connecticut, Storrs, CT, 06268.
F. H. Sanchez
Affiliation:
Department of Physics and Institute of Materials Science, University of Connecticut, Storrs, CT, 06268.
H. C. Hayden
Affiliation:
Department of Physics and Institute of Materials Science, University of Connecticut, Storrs, CT, 06268.
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Abstract

We have carried out a study to understand the mechanisms involved in the formation of buried SIO2 by high dose implantation of oxygen into Si targets. Oxygen ions were implanted at 150 keV with doses up to 2.5 X 1018 ions/cm2 and a current density of less than 10 μA/cm2 into Si 〈100〉 at room and liquid nitrogen temperatures. In-situ Rutherford backscattering (RBS) analysis clearly indicates the formation of uniform buried SIO2 for both room and liquid nitrogen temperatures for doses above 1.5 X 1018/cm2.

Oxygen ions were implanted at room temperature into crystalline quartz to doses of about 1018 ions cm2 at 150 keV, with a current density of 〈10〉10 μA/cm2. The RBS spectra of the oxygen implanted quartz cannot be distinguished from those of unimplanted ones. Furthermore, Si ions were implanted into crystalline quartz at 80 keV and dose of 1 X 1017 Si/cm2, and a current aensity of about 1 μA/cm2. However, no signal from Si in excess of the SiO2 ratio could be observed. Our results obtained by RBS show that implantation of either Si+ or O into SiO2 under conditions stated above does not create a layer whose Si:O ratio differs measurably from that of SiO2.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 53 , 1985 , 233
Copyright
Copyright © Materials Research Society 1986

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References

REFERENCES

1.Pinizzotto, R.F., Mat. Res. Soc. Symp. Proc. 27, 26s (1984).Google Scholar
2.Pinizzotto, R.F., Nucl. Inst. Meth., 17/8 (1985) 261.Google Scholar
3.Wilson, I.A., Nucl. Inst. Meth. in Phys. Res., B1, 331 (1984).Google Scholar
4.Hemment, P.L.F., Maydell-Ondrusz, E., Stephens, K.G., Butcher, J., Ioannou, D. and Alderman, J., Nucl. Inst. Meth., 209/210, 157–164 (1983).Google Scholar
5.Kilner, S.A., Chater, R.J., Hemment, P.L.F., Peart, R.F., Maydell-Ondrusz, E.A., Talor, M.R. and Arrowsmith, R.P., Nucl. Inst. Meth. B7/8 (1985) 291.Google Scholar
6.Mogro-Campero, A., Love, R.P., Lewis, N., Hall, E.L. and McDConnell, M.D., Mat. Res. Symp. Proc., Vol. 45 (1985) 305.Google Scholar
7.Maeyama, S. and Kajiyama, K., Japanese Journal of Applied Physics, Vol. 21, No. 5, (1982) 744.Google Scholar
8.Tekaat, E.H. and Belz, J., Mat. Res. Symp. Proc., Vol. 45 (1985) 329.Google Scholar
9.Hemment, P.L.F., Deart, R.F., Yao, M.F., Stephens, K.G., Arrowsmith, R.P., Charter, R.J., Kilner, J.A., Nucl. Inst. Meth. B6 (1985) 292.Google Scholar
10.Maydell-Ondrusz, E.A. and Wilson, L.H., Thin Solid Films 114 (1984) 357.Google Scholar
11.Jager, H.U., Abstract to 7th International Conference on Ion Beam Analysis, Berlin, July 1985.Google Scholar
12.Namavar, F., Budnick, I.I., Sanchez, F.I. and Hayden, H.C., Mat. Res. Symp., Vol. 45, (1985) 317.Google Scholar
13.Mott, N.F., Phyl. Mag. 45, 323 (1982).Google Scholar
14.Rosencher, E., Straboni, A., Rigo, S. and Amsel, G., Appl. Phys. Lett., 34, 254 (1979).Google Scholar
15.Pfeffer, R. and Ohring, M., J. Appl. Phys., 52, 777 (1981).Google Scholar
16.Mikkelsen, J.C. Jr, Appl. Phys. Lett., 39, 903 (1981).Google Scholar
17.Pretorius, R., Botha, A.D. and Lombaard, J.C., Thin Solid Film 79 (1981) 61; T. Hayashi, H. Okamoto and Y. Homma, JPN J. Appl. Phys., 19 (1980) 1005.Google Scholar
18.Namavar, F., J.11. Budnick, Fasihuddin, A., Sanchez, F.H. and Hayden, H.C., Mat. Res. Symp., this proceeding.Google Scholar