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Focused 0.5 MeV Ion Beam Line with Low Aberration Quadrupole Magnets

Published online by Cambridge University Press:  25 February 2011

K. Inoue ,
M. Takai ,
K. Ishibashi ,
Y. Kawata ,
N. Suzuki  and
S. Namba
K. Inoue
Affiliation:
Electronics Research Laboratory, Kobe Steel Ltd., Nishi-ku, Kobe 673-02, Japan
M. Takai
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
K. Ishibashi
Affiliation:
Electronics Research Laboratory, Kobe Steel Ltd., Nishi-ku, Kobe 673-02, Japan
Y. Kawata
Affiliation:
Electronics Research Laboratory, Kobe Steel Ltd., Nishi-ku, Kobe 673-02, Japan
N. Suzuki
Affiliation:
Electronics Research Laboratory, Kobe Steel Ltd., Nishi-ku, Kobe 673-02, Japan
S. Namba
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
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Abstract

A microbeam line with precisely designed quadrupole magnets has been developed and installed at the Research Center for Extreme Materials, Osaka University. For the purpose of applying the beam line to microbeam RBS/channeling, the damage in <100>Si due to the irradiation of probe beams was studied as a function of incident ion dose from 1015 to 1018 /cm2 with a flux of 8 × 104 nA/cm2. It was found that the dose for channeling measurements should be less than several 1017 /cm2.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 329
Copyright
Copyright © Materials Research Society 1990

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References

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