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Flow Tube Kinetics of Gas-Phase Cvd Reactions

Published online by Cambridge University Press:  22 February 2011

Bruce H. Weiller
Bruce H. Weiller*
Affiliation:
The Aerospace Corporation, Mechanics and Materials Technology Center, PO Box 92957/M5-753, Los Angeles, CA 90009-2957
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Abstract

This paper explores the use of a flow-tube reactor coupled to an FTIR spectrometer to study gas-phase chemical reactions in CVD systems. We show that our apparatus can generate reliable kinetics data by reproducing the literature rate constant for the reaction between O3 and isobutene. We present data from this apparatus on two technologically important systems: TiN from Ti(NMe2)4 (TDMAT) and NH3 and SiO2 from tetraethoxysilane (TEOS) and O3. The results presented include kinetics data for the reaction of Ti(NMe2)4 with NH3 and ND3 at room temperature and the IR spectra of the products from the reaction of TEOS with O3 at 175°C.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 379
Copyright
Copyright © Materials Research Society 1994

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