Hostname: page-component-77c89778f8-swr86 Total loading time: 0 Render date: 2024-07-17T02:20:20.744Z Has data issue: false hasContentIssue false
  • English
  • Français

Fiber Optics-Based Fourier Transform Infrared Spectroscopy for in-Situ Concentration Monitoring in OMCVD

Published online by Cambridge University Press:  22 February 2011

Sateria Salim ,
K.F. Jensen  and
R.D. Driver
Sateria Salim
Affiliation:
Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
K.F. Jensen
Affiliation:
Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
R.D. Driver
Affiliation:
Galileo Electro-Optics Corporation, Sturbridge, MA 01566
Get access

Abstract

Fiber-based Fourier transform infrared spectroscopy for remote in-situ monitoring of organometallic delivery in organometallic chemical vapor deposition (OMCVD) is presented. The measurement is based on infrared absorbance of the organometallic reagent in a short single pass gas cell placed in the gas delivery line of an OMCVD system. The performance of the set-up is demonstrated for monitoring concentration transients during the delivery of two common OMCVD precursors, trimethylgallium (TMG) and trimethylindium (TMI). The time to reach saturation is shown to be faster for a TMG bubbler than for a TMI bubbler. This difference in delivery behavior is interpreted through a mathematical model of the gas handling lines and the monitoring gas cell. The utility of the system in monitoring temporal variations in TMI delivery is also demonstrated. Finally, the ability of the system to detect the chemical species unintentionally present in the feed lines is illustrated with the observation of methane gas from TMG and TMI bubblers that have been dormant for a period time. The methane gas is shown to quickly disappear with repeated used of the bubblers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 324: Symposium K – Diagnostic Techniques for Semiconductor Materials Processing , 1993 , 241
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Kuech, T.K. and Jensen, K.F., “OMVPE of compound semiconductors”, Thin Film Processes - 11, (Vossen, J. L., Kern, W., eds.), Academic Press, San Diego, 1991, pp. 369.CrossRefGoogle Scholar
2. Stringfellow, G.B., Organometallic Vapor Phase Epitaxy, Academic Press, San Diego, 1989.Google Scholar
3. Stagg, J.P., Christer, J., Thrush, E.J. and Crawley, J., “Measurement and control of reagent concentration in MOCVD reactor using ultrasonics”, J. Crystal Growth, 120, 98 (1992).CrossRefGoogle Scholar
4. Hebner, G.A., Kileen, K.P., and Biefeld, R.M., J. Cryst. Growth, 98, 293 (1989).CrossRefGoogle Scholar
5. a) Driver, R.D., Leskowitz, G.M. and Curtiss, L.E., SPIE 1228, Infrared Fiber Optics, 233, (1990). b) M.G. Drexhage, “Glass optical fibers enter the infrared”, Laser Focus World, 27, 149 (1991).Google Scholar
6. Drexhage, M.G. and Moynihan, C.T., “Infrared optical fibers”, Scientific American, 110, September 1988.Google Scholar
7. Salim, S., Lim, C.K., Jensen, K.F. and Driver, R.D., Proc. SPIE, 2069, xxx (1994).Google Scholar
8. Goggeshall, N. D. and Saier, E. L., J. Appl. Phys., 17, 450 (1946).CrossRefGoogle Scholar
9. Frigo, D.M, Berkel, W.W. van, Maasen, W.H.H., Miller, G.P.M. van, Wilker, J.H. and Gal, A.W., J. Cryst. Growth, 124, 99 (1993).CrossRefGoogle Scholar
10. Kuech, T.F., Scilla, G.J. and Cardone, F., J. Cryst. Growth, 93, 550 (1988).CrossRefGoogle Scholar
11. Hill, C.G. Jr., An Introduction to Chemical Engineering Kinetics and Reactor Design Wiley, New York, 1977.Google Scholar