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Fabrication of Nitrided Mask on GaAs surface and Its Machinability for STM lithography

Published online by Cambridge University Press:  01 February 2011

Yo Yamamoto ,
Sota MATSUOKA ,
Toshiyuki Kondo ,
Takahiro Maruyama  and
Shigeya Naritsuka
Yo Yamamoto
Affiliation:
yooym@ccmfs.meijo-u.ac.jp, Meijo Univ., 21stCentury COE Program, 1-501Shiogamagudhi,Tempakuku, NAGOYA, N/A, N/A, Japan
Sota MATSUOKA
Affiliation:
m0534031@ccmailg.meijo-u.ac.jp, Meijo Univ., Dept. of Matterrials Science and Engineering, Japan
Toshiyuki Kondo
Affiliation:
m0434016@ccmailg.meijo-u.ac.jp, Meijo Univ., Dept. of Matterrials Science and Engineering, Japan
Takahiro Maruyama
Affiliation:
takamaru@ccmfs.meijo-u.ac.jp
Shigeya Naritsuka
Affiliation:
narit@ccmfs.meijo-u.ac.jp, Japan
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Abstract

A nitridation mask on a GaAs surface was prepared using RF-MBE and its machinability by STM lithography was studied. A 5.2 nm thick crystal-like layer was formed at 350°C, and was modified by STM at a sample bias of ±80V with good size reliability, which was sufficiently fine for realizing dislocation-free heteroepitaxial growth of GaAs / Si. The mask was maintained up to 620°C under As flux exposure at 1.5 × 10−4 Pa.

Keywords

epitaxyscanning probe microscopy (SPM)crystal growth
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 891: Symposium EE – Progress in Semiconductor Materials V – Novel Materials and Electronics and Optoelectronic Applications , 2005 , 0891-EE03-23
Copyright
Copyright © Materials Research Society 2006

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References

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