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Fabrication and Characterization of Individually Controlled Multi-Pixel Carbon Nanotube Cathode Array Chip for Micro-RT Application for Cancer Research

Published online by Cambridge University Press:  01 February 2011

Sigen Wang
Affiliation:
sgwang@email.unc.edu, University of North Carolina, Department of Radiation Oncology, CB 7512, Chapel Hill, NC, 27599-7512, United States, 9199661101, 9199667681
Zhijun Liu
Affiliation:
zhliu@physics.unc.edu, University of North Carolina, Department of Physics and Astronomy, Chapel Hill, NC, 27599, United States
Lei An
Affiliation:
anlei@physics.unc.edu, University of North Carolina, Department of Physics and Astronomy, Chapel Hill, NC, 27599, United States
Otto Zhou
Affiliation:
zhou@physics.unc.edu, University of North Carolina, Department of Physics and Astronomy, Chapel Hill, NC, 27599, United States
Sha Chang
Affiliation:
sha_chang@med.unc.edu, University of North Carolina, Department of Radiation Oncology, Chapel Hill, NC, 27599, United States
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Abstract

Carbon nanotubes (CNTs) have attracted considerable attention as future field emission electron sources for a variety of applications due to their high aspect ratio and robust structure. One application is multi-pixel beam array x-ray micro-RT (radiotherapy) for small animal irradiation. The x-ray pixel beam array is produced by a CNT pixel cathode array. One challenge in the micro-RT fabrication is how to fabricate individually addressable multi-pixel CNT cathode array on wafer with high pixel beam packing density and high emission current. We report here the development of a new CNT field emission multi-pixel cathode array chip, a vital component of the multi-pixel beam x-ray micro-RT system under development. The CNT field emission cathode array has up to 25 (5 × 5) individually addressable cathode pixels, each is 1 mm in diameter and with center-to-center distance of 2 mm. The fabrication is a two-step process: first a Cr/Cu electrical contact was fabricated on Si substrates with a 5 μm SiO2 dielectric layer using photolithography; and second the CNTs were selectively deposited on 1 mm-diameter predefined Cr/Cu contact dots by using a combined photolithography/electrophotoresis technique. The electron pixel beams produced from the multi-pixel arrays are uniform and individually controllable and can be used for micro-RT application.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

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