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Excimer-Laser Growth of Si Large-Grain Arrays

Published online by Cambridge University Press:  21 March 2011

Masakiyo Matsumura
Masakiyo Matsumura*
Affiliation:
Advanced LCD Technologies Development Center Co., Ltd. 292 Yoshida-cho, Totsuka-ku, Yokohama, 244-0817 Japan
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Abstract

Amorphous silicon (a-Si) Thin Film Transistors (TFT) will continue to play an important role in large-area liquid crystal displays (LCD), however, there is also a strong demand for ultra-high performance TFTs aimed at intelligent small (or medium) size displays. For this reason, “Crystal Si on glass” has become an increasingly attractive solution. This paper reviews recent work performed at ALTEDEC (Advanced LCD Technologies Development Center Co., Ltd, with regard to growing an array of large Si grains at low temperature. The results obtained so far indicate that satisfactory progress has been made towards the achievement of this goal.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 808: Symposium A – Amorphous and Nanocrystaline Silicon Science and Technology-2004 , 2004 , A6.2
Copyright
Copyright © Materials Research Society 2004

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References

REFERENCES

1. Abe, H.et al., 10th International Display Workshops, p.311 (2003).Google Scholar
2. Choi, D.et al., Jpn. J. Appl. Phys., Vol.31, p.4545 (1992).Google Scholar
3. Ishikawa, K. el al., Jpn. J. Appl. Phys., Vol.37, p.731 (1998).Google Scholar
4. Im, J.et al., Phys. Stat. Sol., Vol.166, p.603 (1998).Google Scholar
5. Ishihara, R.et al., Jpn. J. Appl. Phys., Vol.39, p.3872 (2000).Google Scholar
6. Oh, C.et al., Jpn. J. Appl. Phys., Vol.37, p.L492 (1998).Google Scholar
7. Nakata, M.et al., Jpn. J. Appl. Phys., Vol.40, p.3049 (2001).Google Scholar
8. Hiramatsu, M.et al., Electrochem Society Proceedings Vol.2003–08, p701 (2003).Google Scholar
9. Hiramatsu, M.et al., 10th International Display Workshops, p.1675 (2003).Google Scholar
10. Jyuumonji, M.et al., Hyoumen Kagaku (2004), in Press.Google Scholar
11. Taniguchi, Y.et al., Extended Abstracts of The 51th Spring Meeting, The Japan Society of Applied Physics and Related Societies, p.929 (2004) [in Japanese].Google Scholar
12. Ogawa, H.et al., 10th International Display Workshops, p.323 (2003).Google Scholar
13. Jyuumonji, M.et al., to be presented at 2004 Int'l Displays Research Conf. (2004).Google Scholar