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Enhanced Crystallinity of Microcrystalline Silicon Thin Films Using Deuterium in Reactive Magnetron Sputter Deposition at 230°C

Published online by Cambridge University Press:  10 February 2011

J. E. Gerbi ,
P. Voyles ,
J. M. Gibson  and
O J. R. Abelson
J. E. Gerbi
Affiliation:
Coordinated Science Laboratories and the Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign Urbana, IL
P. Voyles
Affiliation:
Department of Physics, University of Illinois at Urbana-Champaign, Urbana IL
J. M. Gibson
Affiliation:
Department of Physics, University of Illinois at Urbana-Champaign, Urbana IL
O J. R. Abelson
Affiliation:
Coordinated Science Laboratories and the Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign Urbana, IL
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Abstract

We analyze the formation kinetics and microstructure of hydrogenated vs. deuterated microcrystalline (μc-Si:H or D) thin films using real-time spectroscopic ellipsometry, post- deposition thermal hydrogen evolution, and TEM. The films are deposited by reactive magnetron sputtering of a silicon target in Ar (1.65 mT) with added partial pressures of H2or D2(0-5.5mT) on Coming 7059 glass substrates at 230°C. Amorphous films are deposited when PH2=0. When hydrogen is added to the chamber, the reactive magnetron sputtering process generates a flux of fast neutral H which promotes stc-Si growth. The substitution of D for H varies the kinetics of hydrogen reflection from the target and implantation into the growing film. We analyze the amorphous to microcrystalline transition as a function of the isotope (H2or D2) and pressure used in the deposition process. We find that the films enter the microcrystalline regime at lower D2pressures than H2pressures. Furthermore, the <ε2> data determined by ellipsometry have a different shape for deuterated films, compared to hydrogenated films at similar growth pressures. This indicates changes in band structure which we interpret as evidence for enhanced crystallinity.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 507: Symposium A – Amorphous & Microcrystalline Silicon Technology 1998 , 1998 , 429
Copyright
Copyright © Materials Research Society 1998

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References

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