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Electroplating of Gold-Tin Solder for Optoelectronic Applications

Published online by Cambridge University Press:  10 February 2011

Wenzhen Sun
Affiliation:
Dept of Chemical & Materials Engineering, University of Alberta, Edmonton, AB, Canada
Douglas G. Ivey
Affiliation:
Dept of Chemical & Materials Engineering, University of Alberta, Edmonton, AB, Canada
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Abstract

Au-Sn eutectic solder is widely used in optoelectronic packaging. Electroplating of Au-Sn alloys is attracting increasing research interest because of its lower cost and potential to minimize voiding in bonding layers. The challenge in developing a non-cyanide Au-Sn electroplating bath lies in bath stability and deposit composition control. In this paper a relatively stable electroplating bath is developed based on a chloride solution using citrate as a buffering agent. Direct current plating and pulse current plating are performed and compared. The effects of Au and Sn concentrations in the bath, current density, and ON time on deposit composition and microstructures are also studied.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1. Johnson, Paul O. and Wolverton, M., Intl. J. Hybrid Microelectron. 14, p. 96 (1991).Google Scholar
2. Kallmayer, C., Lin, D., Kloeser, J., Opperman, H., Zakel, E. and Reichl, H., 1995 IEEE/CPMT 18th International Electronics Manufacturing Technology (IEMT) Symposium, (Omiya, Japan), pp.2028.Google Scholar
3. Katz, A., Lee, C. H. and Tai, K. L., Mater. Chem. Phys. 37, p. 303 (1994).Google Scholar
4. Zakel, Elke et al, Proceedings of the 16th IEEE/CPMT International Electronics Manufacturing Technology (IEMT) Symposium VI, (IEEE, Pidcataway, NU, USA, 1994), pp. 177184.Google Scholar
5. Ivey, D. G., Microstructural Characterization of Au/Sn Solder for Packaging in Optoelectronic Applications, Micron, (accepted in Sept. 1997).Google Scholar
6. Tanabe, Y., Hasegawa, N. and Odaka, M., J. Met. Soc. Jpn. 34, p.452 (1983).Google Scholar
7. Kubota, N., Horikoshi, T. and Sato, E., Plating and Surface Finishing, 71, p. 46 (1984)Google Scholar
8. Kuhn, W., and Zilske, W., Ger. DE 4,406,434 (1995).Google Scholar
9. Morrissey, R. J. and Cranston, R. I., US Patent 5, 277,790 (1994).Google Scholar
10. Matsumoto, S. and Inomata, Y., JP 61 15,992 (1986).Google Scholar
11. Puipe, Jean-Claude and Leaman, Frank, Theory and Practice of Pulse Plating (American Electroplates and Surface Finishers Society, 1986), pp. 124159.Google Scholar
12. Catonne, J. C., Jehanno, J. D., and Royon, J., Proceedings – Interfinish 84, 11th World Congress on Metal Finishing (Jerusalem, Isr, 1984), pp. 191196.Google Scholar