Article contents
Electronics Application for Fullerenes
Published online by Cambridge University Press: 22 February 2011
Abstract
Thin-film Al-C60-Al trilayered structures were sublimated under ultra high vacuum (UHV) conditions for the purpose of investigating their current-voltage (I-V) properties. These metal-semiconductor-metal devices exhibited rapid and irreversible drop in resistance of about two orders of magnitude under an applied voltage of 0.67 to 0.75V. Approximate initial and final resistances were 1050 Ω and 8 Ω respectively. Wavelength Dispersive Spectroscopy (WDS) indicated no noticeable change in phase of the fullerene inter-layer after the irreversible drop in resistance. These results, SEM micrographs and concentration profiles were concordant with diffusion of top layer Al through the fullerene layer as the most likely cause of the change in resistance.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1994
References
REFERENCES
- 4
- Cited by