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Electron Energy Loss Spectroscopy of Polycrystalline and Ion Irradiated Ni-Al Alloys

Published online by Cambridge University Press:  22 February 2011

L.A. Grunest
Affiliation:
Xerox Webster Research Center- W114, Webster, New York 14580
J.C. Barbour
Affiliation:
Dept. of Materials Science and Engineering, Cornell University Ithaca, New York 14853
L.S. Hung
Affiliation:
Dept. of Materials Science and Engineering, Cornell University Ithaca, New York 14853
J.W. Mayer
Affiliation:
Dept. of Materials Science and Engineering, Cornell University Ithaca, New York 14853
J.J. Ritsko
Affiliation:
IBM Thomas J. Watson Research CenterPO Box 218, Yorktown Heights, New York 10598
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Abstract

Ion beam modifications to thin film, polycrystalline Ni-Al alloys have been investigated using high resolution (0.1 eV FWHM) transmission electron energy loss spectroscopy (EELS). The ion induced modification of Ni3 AI,NiAI, Ni2Al3, and NiAl3 as measured by EELS, are compared to concurrent electron microscope diffraction analyses. The EELS coresub level spectra corroborate the NiAI3 to amorphous phase transition observed by diffraction, while the EELS valence spectra provide a signature for the Ni2Al3 to NiAl phase transformation. These results reflect the changes in the electronic states caused by changes in the crystal structure. In addition, perturbations to the electronic states are measured even when no change appears in the diffraction pattern (irradiated NiAl). Thus, high resolution EELS is shown to be a sensitive analytical technique for studying ion irradiated materials.

Type
Research Article
Copyright
Copyright © Materials Research Society 1984

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References

REFERENCES

1. Brimhall, J.L., Kissinger, H.E., and Chariot, L.A., in Metastable Materials Formation by Ion Implantation, edited by Picraux, S.T. and Choyke, W.J., The Materials Reserach Society, Proceedings, Vol.7 (North-Holland, New York), p.235.Google Scholar
2. Liu, Bai-Xin, Johnson, W.L., Nicolet, M-A., and Lau, S.S., Proceedings of the Conierence on Ion Beam Modification of Materials Grenoble 1982 (to be published).Google Scholar
3. Hung, L.S., Nastasi, M., Gyulai, J., and Mayer, J.W., Appl.Phys.Lett. 42, 672 (1983).Google Scholar
4. Tsaur, B.Y., Lau, S.S., and Mayer, J.W., Appl. Phys.Lett. 36, 823(1980).Google Scholar
5. Grunes, L.A., Barbour, J.C., Hung, L.S., Mayer, J.W., and Titsko, J.J., submitted to J.Appl.Physics.Google Scholar
6. Gibbons, P.C., Ritsko, J.J., and Schnatterly, S.E., Rev.Sci.Instrum., 46, 1546 (1975).Google Scholar
7. Feldkamp, L.A., Stearns, M.B., and Shinozaki, S.S., Phys.Rev. B20, 1310 (1979).Google Scholar
8. Raether, H., Excitation of Plasmons and Interband Transitions by Electrons, (Springer, Berlin, 1979) and references therein.Google Scholar
9. Cardonna, M. and Ley, L., Photoemission in Solids I (Springer, New York, 1978).Google Scholar
10. Balzarotti, A., Antonangeli, F., Girlanda, R., and Martino, G., Sol.St. Commun. 44, 275 (1982).Google Scholar