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Effects of the Heat-Treatment Conditions on Microstructures of YbBa2Cu3O7-σ Superconducting Films Formed by the Dipping-Pyrolysis Process

Published online by Cambridge University Press:  10 February 2011

J. Shibata
Affiliation:
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
K. Yamagiwa
Affiliation:
Superconductivity Research Laboratory, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
I. Hirabayashi
Affiliation:
Superconductivity Research Laboratory, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
T. Hirayama
Affiliation:
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
Y. Ikuhara
Affiliation:
Engineering Research Institute, School of Engineering, The university of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, Tokyo 113-8656, Japan
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Abstract

YbBa2Cu3O7-σ(Yb123) films were formed on SrTiO3(STO)(001) and LaAlO3(LAO)(001) substrates by the dipping-pyrolysis process. Using transmission electron microscopy, we investigated effects of the heat-treatment conditions in the processes of the dipping-pyrolysis method on microstructures of these films. As a result, we found that the high heating rates at the initial and final heat-treatments are necessary for achieving the epitaxial growth of the superconducting films.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

1 Bednorz, J.B. and Muller, K.A., Z. Phys., p189, B64(1986).Google Scholar
2 Mclntyre, P.C., Cima, M.J., Smith, J.A. Jr, Hallock, R.B., Siegal, M.P. and Phillips, J.M., J.Appl.phys., p. 1868, 71 (1992).Google Scholar
3 Yamagiwa, K. and Hirabayashi, I., Physica C, p. 12, 304(1998).Google Scholar
4 Shibata, J., Yamagiwa, K., Hirabayashi, I., Ma, X.L., Yuan, J., Hirayama, T. and Ikuhara, Y., Jpn. J. Appl.Phys., p.5050, 38(1999).Google Scholar
5 Shibata, J., Yamagiwa, K., Hirabayashi, I., Hirayama, T. and Ikuhara, Y., Jpn. J. Appl. Phys., in press.Google Scholar