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The Effect of Y on the Strength of FeCrAl Alloy/Sapphire Interfaces

Published online by Cambridge University Press:  11 February 2011

Soumendra N. Basu  and
Vijay K. Gupta
Soumendra N. Basu
Affiliation:
Department of Manufacturing Engineering, Boston University, Boston MA 02215, U.S.A.
Vijay K. Gupta
Affiliation:
Department of Mechanical and Aerospace Engineering, UCLA, Los Angeles, CA 90095, U.S.A.
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Abstract

The effect of Y on the interfacial strength of the FeCrAl/sapphire system has been quantitatively measured by the laser-spallation technique in order to understand the ‘reactive element effect’. The presence of Y improved the interfacial strength of the FeCrAl/sapphire interface in the as-deposited state from 330±31 MPa to 686±36 MPa. However, after a high temperature anneal of 16 hours at 850°C, the interfacial strength of the Y-free samples increased to 545±68 MPa, while the interfacial strength of Y-containing sample decreased to 599±22 MPa. The increase in the interfacial strength of the Y-free films was attributed to an improvement in the crystalline quality of the interface. The decrease in interfacial strength of the annealed Y-containing film in spite of the improvement in the crystalline quality of the interface was attributed to the depletion of Y at the interface due to formation of Y2O3 precipitates, again consistent with the view that Y improves the strength of FeCrAl/sapphire interfaces significantly.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 751: Symposium Z – Structure-Property Relationships of Oxide Surfaces and Interfaces II , 2002 , Z3.24
Copyright
Copyright © Materials Research Society 2003

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References

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