Hostname: page-component-7479d7b7d-m9pkr Total loading time: 0 Render date: 2024-07-12T13:24:28.795Z Has data issue: false hasContentIssue false
  • English
  • Français

The Effect of Residual Stresses on the Rupture Properties of Film/Substrate Samples

Published online by Cambridge University Press:  22 February 2011

M. Ignat ,
A. Chouaf ,
C. Bernard  and
J.M. Terriez
M. Ignat
Affiliation:
L.T.P.C.M. ENSEEG, BP.75 Domaine Universitaire 38402 Saint Martin d'Hères
A. Chouaf
Affiliation:
L.T.P.C.M. ENSEEG, BP.75 Domaine Universitaire 38402 Saint Martin d'Hères
C. Bernard
Affiliation:
L.T.P.C.M. ENSEEG, BP.75 Domaine Universitaire 38402 Saint Martin d'Hères
J.M. Terriez
Affiliation:
IUT - Mécanique - Domaine Universitaire 38402 Saint Martin d'Hères
Get access

Abstract

The residual stresses of two different film/substrate systems were calculated. Besides, several micromechanical tests were performed. Joining the calculated residual stresses to the analysis of the experimental results, some insight on the interfacial adhesion of film/substrate systems is presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 153: Symposium J – Interfaces Between Polymers, Metals, and Ceramics , 1989 , 357
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. - Röll, K. J. Appl. Phys. 47 (7), 3224–3229 (1976).Google Scholar
2. - Widmer, A.E., Rehwald, W. J. Electrochem. Soc. 133 (11), 2403–2409 (1986).Google Scholar
3. - Kinosita, K.. Thin Solid Films (12), 17 (1972).Google Scholar
4. - Timoshenko, S.P., Goodier, J.N., Théorie de l'é1asticité, (Translated from Theory of Elasticity, M.C. Graw Hill, Book Company New York, 1951).Google Scholar
5. - Jones, R.E., Basehore, M.. Appl. Phys. Lett. 50 (12), 725–727 (1987).Google Scholar
6. - Finegan, J.D., Hoffman, R.W., J. Appl. Phys. 30, 597 (1959)Google Scholar
7. - Marshall, D.B., Evans, A.G.. J. Appl. Phys. 56 (10), 2632–2638 (1984).Google Scholar
8. - Sinha, A.K., Levinstein, H.J., Smith, T.E.. J. Appl. Phys. 49 (4) 2423–2426 (1978).Google Scholar
9. - Shintani, A., Sugaki, S., Nakashima, H.. J. Appl. Phys. 51 (8), 4197–4205 (1980).Google Scholar
10. - Glang, R., Holmwood, R.A., Rosenfeld, R.L.. R. of Sc. Instr. 36 (1) 7–10 (1965).Google Scholar
11. - Drum, C.M., Rand, M.J., J. Appl. Phys. (39) 4458–4464 (1968).Google Scholar
12. - Hoffman, R.W., in Physics of non metallic thin films, edited by Dupuy, C. and Cachard, A.. (Plenum New-York 1976, 14) 214–276.Google Scholar