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Effect of Metal Back Contacts on Tetrahedral Amorphous Carbonc Films Grown Using the Cathodic Arc Process.

Published online by Cambridge University Press:  21 March 2011

B.S. Satyanarayana
Affiliation:
Also- Sistec Co Ltd, Nankoku-Shi, Kochi, 783 0014, Japan
H. Takahashi
Affiliation:
Electronic and Photonic Systems Engineering Dept.
T. Narusawa
Affiliation:
Electronic and Photonic Systems Engineering Dept.
A. Hiraki
Affiliation:
KUT Academic & Industrial Collaboration Centre, Kochi University of Technology, Kochi, 782–8502, Japan.
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Abstract

Reported here is a study on the effect of different metal back contacts onthe electrical and structural properties of the tetrahedral amorphous carbon (ta-C). The films were grown using a pulsed cathodic arc system. Ta-C films were deposited simultaneously on silicon substrate, precoated with the following metals, namely aluminium (Al), gold (Au), chromium(Cr), molybdenum (Mo), copper (Cu), tungsten (W) and titanium(Ti). The electrical measurements and Raman response show that the back contact does influence the properties of ta-C films. These results are analysed with respect to our earlier report regarding the influence of back contacts on field emission from similar ta-C films.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. Mckenzie, D.R., Rep. Prog. Phys, 59, 1611, (1996).Google Scholar
2. Milne, W.I., J. Non. Cryst. Solids, 198–200, 605, (1996).Google Scholar
3. Robertson, J., Amorphous carbon: State of art, Ed. Silva, S R P, Robertson, J., Milne, W.I. & Amaratunga, G.A.J., World Scientific p-32, (1998).Google Scholar
4. Lifshitz, Y., Diamond Relat. Mater. 8, 1659, (1999).Google Scholar
5. Fallon, P. J., Veerasamy, V. S., Davis, C. A., Robertson, J., Amaratunga, G. A. J., Milne, W. I., and Koskinen, J., Phys. Rev. B 48, 4777 (1993).Google Scholar
6. Satyanarayana, B S, Robertson, J, Milne, W I, J. App. Phys. 87, 3126, (2000)Google Scholar
7. Diederich, F., Ettl, R., Rubin, Y., Whetten, R.L., Beck, R., Arvarez, M., Anz, S., Sensharuma, D., Wudl, F., Khemani, K.C., & Koch, A.. Science 252, 548 (1991).Google Scholar
8. Iijima, S., Nature 354, 56 (1991).Google Scholar
9. Satyanarayana, B S, Hart, A, Milne, W I & Robertson, J, App Phys Lett 71, 1430 (1997)Google Scholar
10. Krauss, A.R., Aiciello, O., Corrigan, T. D., and Chang, R. P. H., J. Vac. Sci. Technol. B17, 705 (1999)Google Scholar
11. Xu, W. S., Zheng, T., and Latham, R. V., J. Phys. D 26, 1776 (1993).Google Scholar
12. Talin, A.A., Felter, T. E., Friedmann, T. A., Sullivan, J. P., and Siegal, M. P., J. Vac. Sci. Technol. A 14, 1719 (1996)Google Scholar
13. Amaratunga, G.A.J., Baxendale, M., Rupasinghe, N., Alexandrou, I., Chhowalla, M., Butlere, T., Munindradasa, A., Kiley, C.J., Zhang, L., Sakai, T., New Dia. & Frontier Carbon tech. 9, 31, (1999).Google Scholar
14. Obraztsov, O.N., Yu Pavlovsky, I. and Volkov, A.P., J. Vac. Sci. Technol. B 17, 674, (1999).Google Scholar
15. Ferrari, A.C., Satyanarayana, B.S., Milani, P., Barborini, E., Piseri, P., Robertson, J. and Milne, W.I.. Europhys. Lett, 46, 245 (1999).Google Scholar
16. Hart, A., Satyanarayana, B.S., Robertson, J. & Milne, W.I., Appl. Phys. Lett. 74, 594,(1999).Google Scholar
17. Satyanarayana, B.S., Ph.D thesis, Univeristy of Cambridge, UK, (1999).Google Scholar
18. Cheah, L.K., Shi, X., Tay, B.K., Silva, S.R.P. & Sun, Z., Diamond Relat. Mater. 7, 640, (1998).Google Scholar
19. Rupesinghe, N. L., Chhowalla, M., Amaratunga, G. A. J., Weightman, P., Martin, D., Unsworth, P., and Murray, J., App Phys Lett, 77, 1908, (2000).Google Scholar
20. Arena, C., Kleinsorge, B., Robertson, J., Milne, W. I., and Welland, M. E., J.Appl. Phys. 85, (1999) 1609.Google Scholar
21. Ferrari, A.C. and Robertson, J. Phys. Rev. B. 61, 14095, (2000)Google Scholar
22. Shin, Jin-Koog, Lee, Churl Seung, Lee, Kwang-Ryeol, and Eun, Kwang Yong, Appl Phys Lett 78, 631, (2001).Google Scholar
23. Kosarev, A.I., Andronov, A. N., Vinogradov, A. J., Felter, T. E., Titkov, A. N., Makarenko, I.V., Vaqar, M.Z., Robozerov, S. V., Shutov, M. V., J. Vac. Sci. Technol. B 19, 39, (2001).Google Scholar