Hostname: page-component-848d4c4894-wzw2p Total loading time: 0 Render date: 2024-04-30T12:39:35.962Z Has data issue: false hasContentIssue false
  • English
  • Français

Development of the Very thin Microcrystalline N-Layer and its Application to the Stacked Solar Cell

Published online by Cambridge University Press:  21 February 2011

F. Nakabeppu ,
T. Ishimura ,
K. Kumagai  and
K. Fukui
F. Nakabeppu
Affiliation:
CRDL TONEN Corp., 1-3-1, Nishi-turugaoka, Ohi-machi, Iruma-gun, Saitama-ken, 354, Japan
T. Ishimura
Affiliation:
CRDL TONEN Corp., 1-3-1, Nishi-turugaoka, Ohi-machi, Iruma-gun, Saitama-ken, 354, Japan
K. Kumagai
Affiliation:
CRDL TONEN Corp., 1-3-1, Nishi-turugaoka, Ohi-machi, Iruma-gun, Saitama-ken, 354, Japan
K. Fukui
Affiliation:
CRDL TONEN Corp., 1-3-1, Nishi-turugaoka, Ohi-machi, Iruma-gun, Saitama-ken, 354, Japan
Get access

Abstract

In order to improve the efficiency of the amorphous silicon stacked solar cells, we have developed the preparation method of highly conductive very thin microcrystalline silicon n-layers. We have found that the addition of a small amount of Ar gas to deposition gases is effective to make microcrystallite size small. The obtained thin films were characterized by conductivity measurement, R-HEED observation and TEM observation.

This newly developed thin microcrystalline n-layers have been applied to the stacked solar cells. Increase of Jsc by 5-6% has been achieved because of the reduction of light absorption loss in n-layer without decrease of Voc and FF.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 164: Symposium H – Materials Issues in Microcrystalline Semiconductors , 1989 , 389
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Benett, M. S. and Rajan, K., Proc. of 20th IEEE PVSC, pp. 67–72 (1988)Google Scholar
2. Tawada, Y., Takada, J., Fukada, N., Yamaguchi, M., Yamagishi, H., Nishimura, K., Kondo, N., Hosokawa, Y., Tsuge, K., Nakayama, T. and Hatano, I., Appl. Phys. Lett. 48, pp 584–586 (1986)Google Scholar
3. Matsuda, A., J. Non-Cryst. Solids. 59&60, pp. 767–774 (1983)Google Scholar