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Determining Thin Film Density by Energy-Dispersive X-Ray Reflectivity: Application to a Spin-on-Glass Dielectric

Published online by Cambridge University Press:  15 February 2011

W. E. Wallace  and
W. L. Wu
W. E. Wallace
Affiliation:
National Institute of Standards and Technology Bldg. 224, Rm. B320 Gaithersburg, MD 20899 USA
W. L. Wu
Affiliation:
National Institute of Standards and Technology Bldg. 224, Rm. B320 Gaithersburg, MD 20899 USA
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Abstract

A novel method for determining thin film density by energy dispersive x-ray reflectivity is demonstrated for a polymer-derived spin-on-glass dielectric intended for microelectronics applications. The effects of sample misalignment limit the accuracy of x-ray reflectivity as typically practiced. These effects may be properly accounted for by measuring the critical angle for reflection at many different x-ray wavelengths simultaneously. From this measurement, thin film density can be ascertained with much improved accuracy. The results of the x-ray reflectivity measurement are compared to those derived from MeV ion scattering.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 405: Symposium K – Surface/Interface and Stress Effects in Electronic Materials Nanostructures , 1995 , 393
Copyright
Copyright © Materials Research Society 1996

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