Hostname: page-component-77c89778f8-m8s7h Total loading time: 0 Render date: 2024-07-16T11:41:39.305Z Has data issue: false hasContentIssue false
  • English
  • Français

Determination of the Roughness of CVD Surfaces by Laser Scattering

Published online by Cambridge University Press:  15 February 2011

Max Klein  and
Bernard Gallois
Max Klein
Affiliation:
Department of Materials Science and EngineeringStevens Institute of Technology, Hoboken, NJ 07030
Bernard Gallois
Affiliation:
Department of Materials Science and EngineeringStevens Institute of Technology, Hoboken, NJ 07030
Get access

Abstract

A laser scattering apparatus was developed for the determination of surface roughness and other surface statistical parameters of chemically vapor-deposited coatings. Visual examination of HeNe laser scattering patterns reflected from polished sapphire and CVD titanium nitride surfaces showed a sensitivity to roughness differences of tens of nanometers. The scattering apparatus was integrated with a cold-wall CVD reactor. The root mean square roughness of silicon carbide deposits on silicon in the early stages of growth was determined from the intensity of the specularly reflected beam. Changes in roughness and the spatial arrangement of depositing crystallites were monitored in situ by angular resolution of the scattered light spectra. Both ex situ and in situ results were in good agreement with profilometric examinations of the rough surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 250: Symposium R – Chemical Vapor Deposition of Refractory Metals and Ceramics II , 1991 , 85
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Klein, M. and Gallois, B. in Chemical Vapor Deposition of Refractory Metals and Ceramics, edited by Besmann, T.M. and Gallois, B.M. (Mater. Res. Soc. Proc. 168, Pittsburgh, PA 1990) pp. 93–99.Google Scholar
2. Paik, J.S., PhD thesis, Stevens Institute of Technology, 1991.Google Scholar
3. Church, E.L., Jenkinson, H.A. and Zavada, J.M., Opt. Eng. 16 (4), 360–374 (1977).CrossRefGoogle Scholar
4. Marx, E. and Vorburger, T.V., Appl. Opt. 22 (25), 3613–3626 (1990).Google Scholar
5. Klein, M.M., PhD thesis, Stevens Institute of Technology, 1991.Google Scholar
6. Sheldon, B.W. and Besmann, T.M. in Chemical Vapor Deposition of Refractory Metals and Ceramics, edited by Besmann, T.M. and Gallois, B.M. (Mater. Res. Soc. Proc. 168, Pittsburgh, PA 1990) pp. 99–106.Google Scholar
7. Sheldon, B.W. and Besmann, T.M. in Evolution of Thin-Film and Surface Microstructures, edited by Thompson, C.V., Tsao, J.Y. and Srolovitz, D.J. (Mater. Res. Soc. Proc. 202, Pittsburgh, PA 1991) pp. 161–166.Google Scholar
8. Davies, H., Proc. IEEE, Pt. III 101, 118 (1954).Google Scholar
9. Beckmann, P. and Spizzichino, A., The Scattering of Electromagnetic Waves from Rough Surfaces (Macmillan, New York, 1963), p.93.Google Scholar
10. Bennett, H.C. and Porteus, J.D., J. Opt. Soc. Am. 51 (2), 123–129 (1961).CrossRefGoogle Scholar
11. Tanner, L.H. and Fahoum, M., Wear 36, 299–316 (1976).CrossRefGoogle Scholar
12. Stover, J.C., Serati, S.A. and Gillespie, C.H., Opt. Eng. 23 (4), 406–412 (1984).CrossRefGoogle Scholar
13. Robbins, D.J., Pidduck, A.J., Cullis, A.G., Chew, N.G., Hardeman, R.W., Gasson, D.B., Pickering, C., Daw, A.C., Johnson, M.. and Jones, R., J. Cryst. Growth 81 (1–4), 421–427 (1987).CrossRefGoogle Scholar