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Deposition of Polypyrrole into Porous Silicon

Published online by Cambridge University Press:  15 February 2011

J. D. Moreno ,
F. Agullo-Rueda ,
R. Guerrero-Lemus ,
R. J. Martinpalma ,
J. M. Martinez-Duart ,
M. L. Marcos  and
J. Gonzalez-Velasco
J. D. Moreno
Affiliation:
Departamento de Física Aplicada C-12 and Instituto Ciencia de Materiales, CSIC, Universidad Autónoma de Madrid, 28049 Madrid, Spain.
F. Agullo-Rueda
Affiliation:
Departamento de Física Aplicada C-12 and Instituto Ciencia de Materiales, CSIC, Universidad Autónoma de Madrid, 28049 Madrid, Spain.
R. Guerrero-Lemus
Affiliation:
Departamento de Física Aplicada C-12 and Instituto Ciencia de Materiales, CSIC, Universidad Autónoma de Madrid, 28049 Madrid, Spain.
R. J. Martinpalma
Affiliation:
Departamento de Física Aplicada C-12 and Instituto Ciencia de Materiales, CSIC, Universidad Autónoma de Madrid, 28049 Madrid, Spain.
J. M. Martinez-Duart
Affiliation:
Departamento de Física Aplicada C-12 and Instituto Ciencia de Materiales, CSIC, Universidad Autónoma de Madrid, 28049 Madrid, Spain.
M. L. Marcos
Affiliation:
Departamento de Química C-9, universidad Autónoma de Madrid, 28049 Madrid, Spain.
J. Gonzalez-Velasco
Affiliation:
Departamento de Química C-9, universidad Autónoma de Madrid, 28049 Madrid, Spain.
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Abstract

Polypyrrole has been electrocleposited in the interior of the pores that form the Porous Silicon structure, and a very significant increase of the electrical conductivity of the samples has been observed. The degree of filling by the polymer has been found to be highly dependent on the electropolymerization conditions. Micro-Raman Spectroscopy experiments have allowed us to measure the amount of polymer as a function to the distance from the outer PS surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 452 , 1996 , 479
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1.Canham, L.T., Appl. Phys. Lett. 57, 1046 (1990).Google Scholar
2.Wang, J., Zhang, F.L., Wang, W.C., Zheng, J.B., Hou, X.Y. and Wang, X., J. Appl. Phys. 75, 1070 (1994).Google Scholar
3.Jeske, M., Schultze, J.W., Thönissen, M., Münder, H., Thin Solid Films 255, 63 (1995).Google Scholar
4.Guerrero-Lemus, R., Moreno, J.D., Martinez-Duart, J.M., Marcos, M.L., González-Velasco, J. and Gómez, P., J. Appl. Phys. 79, 3224 (1996).Google Scholar
5.Schultze, J.W. and Jung, K.G., Electrochim. Acta 40, 1369 (1995).Google Scholar