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Deposition of Lead-Silicate Glassy Thin Coatings by Rf Magnetron Sputtering: Correlation Between Deposition Parameters and Electrical and Structural Properties

Published online by Cambridge University Press:  21 February 2011

V. Rigato ,
G. Maggioni ,
D. Boscarino  and
G. Della Mea
V. Rigato
Affiliation:
INFN, Laboratori Nazionali di Legnaro, 35020 Legnaro (Pd), Italy INFM, Dipartimento di Fisica, Université di Padova, 35131 Padova, Italy
G. Maggioni
Affiliation:
INFN, Laboratori Nazionali di Legnaro, 35020 Legnaro (Pd), Italy
D. Boscarino
Affiliation:
INFN, Laboratori Nazionali di Legnaro, 35020 Legnaro (Pd), Italy
G. Della Mea
Affiliation:
INFN, Laboratori Nazionali di Legnaro, 35020 Legnaro (Pd), Italy Dipartimento di Ingegneria dei Materiali, Università di Trento, 38050 Mesiano, Italy
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Abstract

Thin films (100–400 nm) of lead silicate glass have been deposited by RF magnetron sputtering in Ar plasma at different discharge conditions. The interaction of the sputtered species with the gas atoms during the transport process through the discharge region and the kinetics of growth of the films have been investigated as a function of the target composition and of the substrate temperature. This study demonstrates the possibility of controlling the surface electrical resistance of the films in a wide range of values ranging from 1012 to 1017 during the film growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 396: Symposium A – Ion-Solid Interactions for Materials Modification and Processing , 1995 , 285
Copyright
Copyright © Materials Research Society 1996

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References

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