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Dendritic Growth During Phase Transformation in Ni-Mo System Induced by Ion Beam

Published online by Cambridge University Press:  28 February 2011

B. X. Liu ,
L. J. Huang  and
C. H. Shang
B. X. Liu
Affiliation:
Department of Engineering Physics, Tsinghua University, Beijing, CHINA
L. J. Huang
Affiliation:
Department of Engineering Physics, Tsinghua University, Beijing, CHINA
C. H. Shang
Affiliation:
Department of Engineering Physics, Tsinghua University, Beijing, CHINA
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Abstract

Multilayered Ni-Mo films were irradiated by 200keV Xe ions at room temperature to various doses. The beam current density was confined to be less than lμA/cm2 to avoid overheating. The experimental evidences from X-ray diffraction, electrical resistivity, as well 4 as Rutherford Backscattering, indicate that a dose of 7 × 1014/cm2 was the critical one for uniform mixing of the layers and amorphous phase formation in Ni65 Mo35 films. Under this critical dose, various dendritic patterns were formed as revealed by bright field transmission electron microscopy. The microscopic mechanisms of the ion induced dendritic growth are attributed to the cluster formation and the aggregation of the formed clusters.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 74: Symposium A – Beam-Solid Interactions and Transient Processes , 1986 , 511
Copyright
Copyright © Materials Research Society 1987

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