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Degradation Kinetics of Hydrogenated Amorphous Silicon: The Effect of Embedded Microcrystallites

Published online by Cambridge University Press:  10 February 2011

Yoram Lubianiker ,
J. David Cohen ,
Hyun-Chul Jin  and
John R. Abelson
Yoram Lubianiker
Affiliation:
Department of Physics, University of Oregon, Eugene, OR 97403
J. David Cohen
Affiliation:
Department of Physics, University of Oregon, Eugene, OR 97403
Hyun-Chul Jin
Affiliation:
Department of Materials Science and Engineering, University of Illinois, Urbana, IL 61801
John R. Abelson
Affiliation:
Department of Materials Science and Engineering, University of Illinois, Urbana, IL 61801
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Abstract

We have studied the degradation kinetics of undoped a-Si:H films which contain a significant fraction of silicon microcrystallites. The degradation rate is found to be exceptionally slow in the first stage of degradation, then the defect density follows the “normal” t1/3rate and finally saturates. We present a model which relates this abnormal kinetics to the microcrystallites which are embedded in the amorphous matrix.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 507: Symposium A – Amorphous & Microcrystalline Silicon Technology 1998 , 1998 , 729
Copyright
Copyright © Materials Research Society 1998

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References

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