Hostname: page-component-848d4c4894-pjpqr Total loading time: 0 Render date: 2024-06-25T23:21:05.781Z Has data issue: false hasContentIssue false
  • English
  • Français

CVD Diamond Synthesis on WC-Co Cutting Tool via Electrophoretic Seeding Process

Published online by Cambridge University Press:  17 March 2011

Toshiki Tsubota ,
Naoki Okada ,
Shintaro Ida ,
Masanori Nagata ,
Yasumichi Matsumoto  and
Nobumitsu Yatsushiro
Toshiki Tsubota
Affiliation:
Kumamoto Industrial Research Institute, Material Development Department, 3-11-38 Higashi-machi, Kumamoto, 862-8581, Japan
Naoki Okada
Affiliation:
Kumamoto University, Faculty of Engineering 2-39-1 Kurokami, Kumamoto, 860-8555, Japan
Shintaro Ida
Affiliation:
Kumamoto University, Faculty of Engineering 2-39-1 Kurokami, Kumamoto, 860-8555, Japan
Masanori Nagata
Affiliation:
Kumamoto Industrial Research Institute, Material Development Department, 3-11-38 Higashi-machi, Kumamoto, 862-8581, Japan
Yasumichi Matsumoto
Affiliation:
Kumamoto University, Faculty of Engineering 2-39-1 Kurokami, Kumamoto, 860-8555, Japan
Nobumitsu Yatsushiro
Affiliation:
Kumabou METAL 1-4-15 Nagamine, Kumamoto, 862-0937, Japan
Get access

Abstract

Electrophoretic deposition was effective for the synthesis of the film type CVD diamond on the WC cutting tool without removing cobalt on the surface, although the adhesion force of CVD diamond was insufficient for the application to a cutting tool. Heat treatment after electrophoretic deposition improved the adhesion force.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 697: Symposium P – Surface Engineering 2001--Fundamentals and Applications , January 2001 , P5.8
Copyright
Copyright © Materials Research Society 2002

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Lee, D.-G., and Singh, R. K., Appl. Phys. Lett. 70, 1542–1997 (1997).Google Scholar
2. Zhitomirsky, I., Mater. Lett. 37, 72–1998 (1998).Google Scholar
3. Lee, D.-G., and Singh, R. K., Appl. Phys. Lett. 70, 1542–1997 (1997).Google Scholar
4.E. Maillard-Schaller, Kuettel, O. M., Diederich, L., Schlapbach, L., Zhirnov, V. V., and Belobrov, P. I., Diamond Relat. Mater. 8, 805–1999 (1999).Google Scholar
5. Peters, M. G., and Cummings, R. H., US Patent No. 5,236,740, 1993.Google Scholar
6. Oles, E. J., and Inspektor, A., Bauer, C. E., Diamond Relat. Mater. 5, 617–1996 (1996).Google Scholar
7. Singh, R. K., Gilbert, D. R., Gerald, J. F., Harkness, S., and Lee, D. G., Science 272, 396–1996 (1996).Google Scholar
8. Köpf, A., Haubner, R., and Lux, B., Diamond Relat. Mater. 9, 494–2000 (2000).Google Scholar
9. Zhang, Z. M., He, X. C., Shen, H. S., Sun, F. H., Chen, M., and Wan, Y. Z., Diamond Relat. Mater. 9, 1749–2000 (2000).Google Scholar
10. Polini, R., D'Antonio, P., Casto, S. Lo, Ruisi, V. F., and Traversa, E., Surf. Coat. Technol. 123, 78–2000 (2000).Google Scholar
11. Amirhaghi, S., Reehal, H. S., Plappert, E., Bajic, Z., Wood, R. J. K., and Wheeler, D. W., Diamond Relat. Mater. 8, 845–1999 (1999).Google Scholar
12. Silva, S., Mammana, V. P., Salvadori, M. C., Monteriro, O. R., and Brown, I. G., Diamond Relat. Mater. 8, 1913–1999 (1999).Google Scholar
13. Cappelli, E., Orlando, S., Pinzari, F., Napoli, A., and Kaciulis, S., Applied surface Science 138–139, 376–1999 (1999).Google Scholar
14. Kolber, T., Koepf, A., Haubner, R., and Hutter, H., International Journal of Refractory Metals & Hard Materials 17, 445–1999 (1999).Google Scholar
15. Faure, C., Hänni, W., Schmutz, C. J., and Gervanoni, M., Diamond Relat. Mater. 8, 830–1999 (1999).Google Scholar
16. Lin, C. R., Kuo, C. T., and Chang, R. M., The Solid Films 308–309, 273–1997 (1997).Google Scholar
17. Sato, Y., and Kamo, M., hyomen 19, 197–1981 (1981).Google Scholar