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Correlation of Microwave Dielectric Properties and Microstructure of Unpatterned Ferroelectric Thin Films

Published online by Cambridge University Press:  01 February 2011

R. G. Geyer ,
M.W. Cole ,
P.C. Joshi ,
E. Ngo ,
C. Hubbard ,
W. Nothwang ,
M. Bratcher ,
M. Ervin  and
M. Wood
R. G. Geyer
Affiliation:
National Institute of Standards, RF Technology Division, Boulder, CO 80303, U.S.A., 303/497-5852 geyer@boulder.nist.gov
M.W. Cole
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate Aberdeen Proving Ground, MD 21005, U.S.A., 410/306-0747 mcole@arl.army.mil
P.C. Joshi
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate Aberdeen Proving Ground, MD 21005, U.S.A., 410/306-0747 mcole@arl.army.mil
E. Ngo
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate Aberdeen Proving Ground, MD 21005, U.S.A., 410/306-0747 mcole@arl.army.mil
C. Hubbard
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate Aberdeen Proving Ground, MD 21005, U.S.A., 410/306-0747 mcole@arl.army.mil
W. Nothwang
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate Aberdeen Proving Ground, MD 21005, U.S.A., 410/306-0747 mcole@arl.army.mil
M. Bratcher
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate Aberdeen Proving Ground, MD 21005, U.S.A., 410/306-0747 mcole@arl.army.mil
M. Ervin
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate Aberdeen Proving Ground, MD 21005, U.S.A., 410/306-0747 mcole@arl.army.mil
M. Wood
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate Aberdeen Proving Ground, MD 21005, U.S.A., 410/306-0747 mcole@arl.army.mil
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Abstract

The influence of low concentration (1 mol%) Mg doping on the structural, microstructural, surface morphological and dielectric properties of Ba1-xSrxTiO3 thin films has been measured and analyzed. The films were fabricated on MgO and Pt-Si substrates via the metalorganic solution deposition technique using carboxylate-alkoxide precursors and post deposition annealed at 800 °C (film/MgO substrates) and 750 °C (film/Pt-Si substrates). The structure, microstructure, surface morphology and film/substrate compositional quality were analyzed and correlated to the films dielectric and insulating properties. Dielectric properties of unpatterned films were measured at 10 GHz with a coupled/split dielectric resonator system and at 100 kHz using metal-insulator-metal capacitors. The Mg-doped BST films exhibited improved dielectric loss and insulating characteristics compared to the undoped Ba0.6Sr0.4TiO3 thin films. The improved dielectric properties, low leakage current, and good tunability of the low level Mgdoped BST thin films merit strong potential for utilization in microwave tunable devices.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 720: Symposium H – Materials Issues for Tunable RF and Microwave Devices III , 2002 , H4.3
Copyright
Copyright © Materials Research Society 2002

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