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Correlation of Electrical and Physical Properties of SIMOX BOX Affected by Various Implantation Parameters

Published online by Cambridge University Press:  10 February 2011

J. U. Yoon ,
G. N. Kim ,
J‐H Y. Krska ,
J. E. Chung ,
L. P. Allen ,
K. Goodson ,
O. Kaeding  and
K. Nauka
J. U. Yoon
Affiliation:
Mxassachusetts Institute of Technology, Cambridge, MA 02139
G. N. Kim
Affiliation:
Mxassachusetts Institute of Technology, Cambridge, MA 02139
J‐H Y. Krska
Affiliation:
Mxassachusetts Institute of Technology, Cambridge, MA 02139
J. E. Chung
Affiliation:
Mxassachusetts Institute of Technology, Cambridge, MA 02139
L. P. Allen
Affiliation:
Ibis Technology Corp, Danvers, MA 01923
K. Goodson
Affiliation:
Stanford University, Stanford, CA 94305
K. Nauka
Affiliation:
Hewlett‐Packard, Palo Alto, CA 94304
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Abstract

The impact of two implant parameters, namely the implant substrate temperature and implant beam current, on the physical and electrical properties of SIMOX buried oxide are investigated. Three implant substrate temperatures, 540 °C, 590 °C, and 640 °C and three beam current, 45 mA, 55 mA, 65 mA, are investigated. Results from thermal conductivity and surface photovoltage measurements show no apparent differences between samples. Results from interface roughness shows a decreasing trend as the substrate temperature and beam current increases. For the samples with different implant temperatures, the high‐field conduction shows an opposite dependence for top‐interface versus substrate injection. This behavior can be explained by the conservation of silicon in the buried oxide. Correlation of surface photovoltage and high‐field conduction shows weak positive dependency while that of interface roughness and high‐field conduction shows dependency only when the sets of temperature variation and beam current variation are decoupled.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 446: Amorphous and Crystalline Insulating Thin Films–1996 , 1996 , 193
Copyright
Copyright © Materials Research Society 1997

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References

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