Hostname: page-component-76fb5796d-dfsvx Total loading time: 0 Render date: 2024-04-26T16:54:02.584Z Has data issue: false hasContentIssue false

Comparisons and analyses on heterostructures consisting of ZnO and different ferroelectric films

Published online by Cambridge University Press:  13 July 2011

Nai-wen ZHANG
Affiliation:
Institute of Microelectronics, Tsinghua National Laboratory for Information Science and TechnologyTsinghua University, Haidian District, Beijing, 100084, China
Ze JIA*
Affiliation:
Institute of Microelectronics, Tsinghua National Laboratory for Information Science and TechnologyTsinghua University, Haidian District, Beijing, 100084, China
Ming-ming ZHANG
Affiliation:
Institute of Microelectronics, Tsinghua National Laboratory for Information Science and TechnologyTsinghua University, Haidian District, Beijing, 100084, China
Tian-ling REN
Affiliation:
Institute of Microelectronics, Tsinghua National Laboratory for Information Science and TechnologyTsinghua University, Haidian District, Beijing, 100084, China
*
*Corresponding author’s E-mail: jiaze@tsinghua.edu.cn
Get access

Abstract

Two different types of ferroelectric/semiconductor heterostructures, made up of Pb(Zr,Ti)O3/ZnO and BiFeO3/ZnO respectively, were fabricated on Pt(111)/Ti/SiO2/Si(100) by sol-gel process. Obvious diodelike behavior were observed in BiFeO3/ZnO heterostructures when current-voltage characteristics were measured, while Pb(Zr,Ti)O3/ZnO heterostructures exhibited a symmetrical behavior. It is found that Pb(Zr,Ti)O3/ZnO heterostructures showed a large polarization and the remnant polarization was approximately 15μC/cm2. The remnant polarization performed a modulation on the channel resistance. The different properties of two heterostructures might lead to different applications.

Type
Research Article
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Meyer, R., Waser, R., J. Appl. Phys. 100, 051611(2006).Google Scholar
2. Cagin, E., Chen, D. Y., Siddiqui, J. J., Phillips, J. D., J. Phys. D: Appl. Phys. 40, 24302434(2007).Google Scholar
3. Pintilie, L., Dragoi, C., Radu, R., Costinoaia, A., Stancu, V., Pintilie, I., Appl. Phys. Lett. 96, 012903(2010).Google Scholar
4. Singh, S. K., Ueno, R., Funakubo, H., Uchida, H., Koda, S., Ishiwara, H., Jpn. J. Appl. Phys. 44, 85258527(2005).Google Scholar
5. Wu, J., Lou, X., Wang, Y., Wang, J., Electrochemical and Solid-State Letters 13, G9G12(2010).Google Scholar
6. Li, J., Wang, J., Ruette, B., Pyatakov, A. P., Zvezdin, A. K., Viehland, D., Appl. Phys. Lett. 84, 52615263(2004).Google Scholar
7. Singh, S. K., Ishiwara, H., Jpn. J. Appl. Phys. 4, L734L736(2005).Google Scholar
8. Singh, S. K., Ishiwara, H., Maruyama, K., J. Appl. Phys. 100, 064102(2006).Google Scholar