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A Comparative Study Between high and low Temperature Thermally Controlled Crystallization of thin films

Published online by Cambridge University Press:  15 February 2011

Richard D. Robinson  and
Ioannis N. Miaoulis
Richard D. Robinson
Affiliation:
Thermal Analysis of Materials Processing Laboratory, Mechanical Engineering Department, Tufts University, Medford, MA 02155
Ioannis N. Miaoulis
Affiliation:
Thermal Analysis of Materials Processing Laboratory, Mechanical Engineering Department, Tufts University, Medford, MA 02155
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Abstract

Numerical simulation of zone-Melting recrystallization (ZMR) was conducted to determine the heat transfer dynamics over a wide range of temperatures. ZMR is a thermal processing technique used to recrystallize Materials. Therefore, the thermal effects induced by the ZMR process critically affect the crystallization dynamics. Parametric studies indicated that the conductive heat flux from the heat source through the gas accounted for at least 15% of the total energy heating the film for materials with melting points less than 800°C. The influence of this conductive heating has been neglected in past analyses. Also, Materials with higher melting points are less sensitive to changes in the heat flux from the heat source. Slight variations of thermal gradients in the film can lead to different qualities of crystal, so care must be taken when processing materials with lower melting points, since they are more sensitive to temperature variation. This paper analyzes the dominant modes of heat transfer in ZMR over a wide range of temperatures that influence the recrystallization dynamics.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 321: Symposium E – Crystallization and Related Phenomena in Amorphous Materials—Ceramics, Metals, Polymers, and Semiconductors , 1993 , 627
Copyright
Copyright © Materials Research Society 1994

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References

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