Hostname: page-component-7bb8b95d7b-dtkg6 Total loading time: 0 Render date: 2024-09-12T00:39:59.919Z Has data issue: false hasContentIssue false

Combinatorial Approach to Thin-Film Silicon Materials and Devices

Published online by Cambridge University Press:  01 February 2011

Qi Wang
Affiliation:
National Renewable Energy Laboratory (NREL), 1617 Cole Blvd., Golden, CO 80401, U.S.A.
Leandro R. Tessler
Affiliation:
Instituto de Física “Gleb Wataghin,”Unicamp, C. P. 6165, 13083-970 Campinas, SP, Brazil
Helio Moutinho
Affiliation:
National Renewable Energy Laboratory (NREL), 1617 Cole Blvd., Golden, CO 80401, U.S.A.
Bobby To
Affiliation:
National Renewable Energy Laboratory (NREL), 1617 Cole Blvd., Golden, CO 80401, U.S.A.
John Perkins
Affiliation:
National Renewable Energy Laboratory (NREL), 1617 Cole Blvd., Golden, CO 80401, U.S.A.
Daxing Han
Affiliation:
Department of Physics & Astronomy, University of North Carolina at Chapel Hill, Chapel Hill, NC, 27599U.S.A.
Dave Ginley
Affiliation:
National Renewable Energy Laboratory (NREL), 1617 Cole Blvd., Golden, CO 80401, U.S.A.
Howard M. Branz
Affiliation:
National Renewable Energy Laboratory (NREL), 1617 Cole Blvd., Golden, CO 80401, U.S.A.
Get access

Abstract

We apply combinatorial approaches to thin-film Si materials and device research. Our hot-wire chemical vapor deposition chamber is fitted with substrate xyz translation, a motorized shutter, and interchangable shadow masks to implement various combinatorial methods. For example, we have explored, in detail, the transition region through which thin Si changes from amorphous to microcrystalline silicon. This transition is very sensitive to deposition parameters such as hydrogen-to-silane dilution of the source gas, chamber pressure, and substrate temperature. A material library, on just a few substrates, led to a three-dimensional map of the transition as it occurs in our deposition system. This map guides our scientific studies and enables us to use several distinct transition materials in our solar-cell optimization research. We also grew thickness-graded wedge samples spanning the amorphous-to-microcrystalline Si transition. These single stripes map the temporal change of the thin silicon phase onto a single spatial dimension. Therefore, the structural, optical, and electrical properties can easily be studied through the phase transition. We have examined the nature of the phase change on the wedges with Raman spectroscopy, atomic force microscopy, extended x-ray absorption fine structure (EXAFS), x-ray absorption near-edge spectroscopy (XANES), ultraviolet reflectivity, and other techniques. Combinatorial techniques also accelerate our device research. In solar cells, for example, the combinatorial approach has significantly accelerated the optimization process of p-, i-, n-, and buffer layers through wide exploration of the complex space of growth parameters and layer thicknesses. Again, only a few deposition runs are needed. It has also been useful to correlate the materials properties of single layers in a device to their performance in the device. We achieve this by depositing layers that extend beyond the device dimensions to permit independent characterization of the layers. Not only has the combinatorial approach greatly increased the rate of materials and device experimentation in our laboratory, it has also been a powerful tool leading to a better understanding of structure-property relationships in thin-film Si.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Xiang, X.-D., Sun, X., Briceno, G., Lou, Y., Wang, K.-A, Chang, H., Wallace-Freedman, W. G., Chen, S.-W., and Schultz, P.G., Science, 268, p. 1738, 1995.Google Scholar
2. Xiang, X-D., Materials Science & Engineering. B, 56, p. 247, 1998.Google Scholar
3. Wang, Qi, Yue, Guozhen, Li, Jing, and Han, D., Solid State Commun., 113 p. 175, 2000.Google Scholar
4. Wang, Qi, Perkins, J., Branz, H., Alleman, J., Duncan, C., and Ginley, D., Applied Surface Science, 189 p. 271, 2002.Google Scholar
5. Hanak, J.J., J. Mat. Science, 5 p. 964, 1970.Google Scholar
6. Yang, L. and Chen, L.-F., Mat. Res. Soc. Proc., 336, p. 669. 1994.Google Scholar
7. Yang, J. and Guha, S., Mat. Res. Soc, Proc., 557, p. 239, 1999.Google Scholar
8. Mahan, A.H., Carapella, J., Nelson, B.P., Crandall, R.S., and Balberg, I., J. Appl. Phys., 69 p. 6728, 1991.Google Scholar
9. Wang, Qi, Thin Solid Films, (2nd HWCVD Conference) to be published, 2003.Google Scholar
10. Yue, G.Z., Lorentzen, J. D., Lin, J., Han, D.X, and Wang, Q., Appl. Phys. Lett., 67 p. 3468, 1999.Google Scholar
11. Yue, G.Z., Lin, J., Wu, L., Han, D.X., and Wang, Q., Mat. Res. Soc. Proc., 557, p. 525, 1999.Google Scholar
12. Greenaway, D.L., Harbeke, G., Optical Properties of Semiconductors, Pergamon, New York, 1968.Google Scholar
13. Collins, R. W., Koh, J., Ferlauto, A.S., Rovira, P.I., Lee, Y., Koval, R.J., and Wronski, C.R.. Thin Solid Films, 364, p.129. 2000.Google Scholar
14. Tessler, Leandro R., Wang, Q., and Branz, H.M., Thin Solid Films, (2nd HWCVD Conference) to be published, 2002.Google Scholar
15. Rehr, J. J., and Albers, R.C., Rev. Mod. Phys., 72 p. 621, 2000.Google Scholar