Hostname: page-component-7479d7b7d-pfhbr Total loading time: 0 Render date: 2024-07-12T19:26:56.807Z Has data issue: false hasContentIssue false
  • English
  • Français

Circuit Pattern cu Deposition on Polyimide Surface Using ArF Excimer Laser

Published online by Cambridge University Press:  10 February 2011

M. Tomita  and
M. Murahara
M. Tomita
Affiliation:
Faculty of Engineering, Tokai University, 1117 kitakaname,Kanagawa,259-1292, JAPAN
M. Murahara
Affiliation:
Faculty of Engineering, Tokai University, 1117 kitakaname,Kanagawa,259-1292, JAPAN
Get access

Abstract

Circuit patterned nucleation of copper atoms onto polyimide surface was demonstrated by using ArF excimer laser (λ =193nm) and copper sulfate aqueous solution at an atmospheric pressure. Photo-excited C-H bonds of the polyimide surface were effectively dehydrated with hydrogen atoms which were photodissociated from the water. The dangling bonds of the dehydrated hydrogen atoms were combined with the oxygen and the copper atoms which were photodissociated by copper-sulfate aqueous solution. Thus, C-O-Cu bonds were formed on the surface. After this copper substitution, it was carried out onto the nucleated parts by usual electroless plating at 70°C. In this process, the conductive circuit pattern Cu thin film was deposited on polyimide surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 546: Symposium AA – Materials Science of Microelectromechanical Systems (MEMS)… , 1998 , 207
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Zweing, A.D. and deutsch, T.F.: Mat. Res. Soc. Symp. Proc. Vol.239, 47, (1992)Google Scholar
2. Okoshi, M., Kashiura, H., Miyokawa, T., Toyoda, K. and Murahara, M.; Mat. Res. Soc. Fall Meeting (Boston), A191, (1992)Google Scholar
3. Okoshi, M., Kashiura, H., Miyokawa, T., Toyoda, K.; Mat. Res. Soc. Symp. Proc. Vol.279. 737 (1993)Google Scholar
4. Okoshi, M., Murahara, M. and Toyoda, K.; Mat. Res. Soc. Symup. Proc. Vol.201. 451 (1990)Google Scholar
5. Aoike, M., Hatao, K., Matsuno, H., Igarashi, R. and Murahara, M.; Extend Abstracts: (The 56th Autumn Meeting 1995); The Japan Society of Applied Physics No.2,571(1995)Google Scholar
6. Okoshi, M., Toyoda, K. and Murahara, M.; Mat. Res. Soc. Symp. Proc. Vol.397. 655 (1996)Google Scholar
7. Okoshi, M. and Murahara, M.; Appl. Phys. Lett. Vol.72, No. 20, 18, 2616 (1998)Google Scholar
8. Okamoto, T., Hhatao, K., Shimizu, T., Aoike, M. and Murahara, M.; Mat. Res. Syrup. Proc. Vol.397, 555–559 (1996)Google Scholar