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Chemical Vapor Deposition of Strontium-Barium-Niobate

Published online by Cambridge University Press:  25 February 2011

A. Greenwald
Affiliation:
Spire Corporation, One Patriots Park, Bedford, MA 01730-2396
M. Horenstein
Affiliation:
Boston University, Boston, MA
M. Ruane
Affiliation:
Boston University, Boston, MA
W. Clouser
Affiliation:
Boston University, Boston, MA
J. Foresi
Affiliation:
Boston University, Boston, MA
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Abstract

Spire Corporation has deposited strontium-barium-niobate by chemical vapor deposition at atmospheric pressure using Ba(TMHD), Sr(TMHD), and Nb ethoxide. Deposition temperature as 550°C in an isothermal furnace. Films were deposited upon silicon (precoated with silica), platinum, sapphire, and quartz. Materials were characterized by RBS, X-ray diffraction, EDS, electron, and optical microscopy. Electrical and optical properties were measured at Boston University.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

1. Barron, A., “Group HA Metal-Organics as MOCVD Precursors for High T. Superconductors,” Strem Chemiker v.XXII no. 1 (Strem Chemical Co., Newburyport, MA, 1990).Google Scholar
2. Kurtz, S. and Gordon, R., SERI report contract # SERI/XB-5-05096-1, prime contract to DOE EG-77-01-4042 (1986).Google Scholar
3 Chen, C.J. et al. , in Sol-Gel Optics, (SPIE v. 1328, 1990) p. 441.Google Scholar