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Chemical Vapor Deposition of Strontium-Barium-Niobate

Published online by Cambridge University Press:  25 February 2011

A. Greenwald ,
M. Horenstein ,
M. Ruane ,
W. Clouser  and
J. Foresi
A. Greenwald
Affiliation:
Spire Corporation, One Patriots Park, Bedford, MA 01730-2396
M. Horenstein
Affiliation:
Boston University, Boston, MA
M. Ruane
Affiliation:
Boston University, Boston, MA
W. Clouser
Affiliation:
Boston University, Boston, MA
J. Foresi
Affiliation:
Boston University, Boston, MA
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Abstract

Spire Corporation has deposited strontium-barium-niobate by chemical vapor deposition at atmospheric pressure using Ba(TMHD), Sr(TMHD), and Nb ethoxide. Deposition temperature as 550°C in an isothermal furnace. Films were deposited upon silicon (precoated with silica), platinum, sapphire, and quartz. Materials were characterized by RBS, X-ray diffraction, EDS, electron, and optical microscopy. Electrical and optical properties were measured at Boston University.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 243: Symposium G – Ferroelectric Thin Films II , 1991 , 457
Copyright
Copyright © Materials Research Society 1992

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References

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