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Chemical Vapor Deposition (CVD) of Parylene Films using Liquid Source Delivery

Published online by Cambridge University Press:  10 February 2011

Chongying Xu  and
Thomas H. Baum
Chongying Xu
Affiliation:
Advanced Delivery and Chemical Systems, Ltd., Advanced Technology Materials, Inc., 7 Commerce Drive, Danbury, CT 06810., cxu@atmi.com and tbaum@atmi.com.
Thomas H. Baum
Affiliation:
Advanced Delivery and Chemical Systems, Ltd., Advanced Technology Materials, Inc., 7 Commerce Drive, Danbury, CT 06810., cxu@atmi.com and tbaum@atmi.com.
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Abstract

Parylene-N films were formed on silicon substrates at a substrate temperature of −20 °C and pressures from 4 - 7 torr via liquid source precursor delivery. [2.2 ] Paracyclophane, the precursor of parylene-N, was dissolved in an organic solvent and delivered into a vaporizer / pyrolysis unit. The solution was vaporized at ∼ 200 °C and its vapor was cracked at ∼ 700 °C to generate the reactive morromeric species. Films were grown by condensation and polymerization, and analyzed by infrared (FTIR), thermogravimetric analysis (TGA) and X-ray diffraction (XRD) analysis. These analyses indicated the formation of parylene-N films without detectable solvent contamination or incorporation into the polymeric films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 555: Symposium OO – Properties and Processing of Vapor-Deposited Coatings , 1998 , 155
Copyright
Copyright © Materials Research Society 1999

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