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Characterization of Multilayer Thin Film Structures for Gas Sensor Applications

Published online by Cambridge University Press:  15 February 2011

M. Dibattista
Affiliation:
University of Michigan, Department of Chemical Engineering, Ann Arbor, MI 48109
S. V. Patel
Affiliation:
University of Michigan, Department of Chemical Engineering, Ann Arbor, MI 48109
K. D. Wise
Affiliation:
University of Michigan, Department of Electrical Engineering and Computer Science, Ann Arbor, MI 48109
J. L. Gland
Affiliation:
University of Michigan, Department of Chemical Engineering, Ann Arbor, MI 48109 University of Michigan, Department of Chemistry, Ann Arbor, MI 48109
J. F. Mansfield
Affiliation:
University of Michigan, Department of Electron Microbeam Analysis Lab, Ann Arbor, MI 48109
J. W. Schwank
Affiliation:
University of Michigan, Department of Chemical Engineering, Ann Arbor, MI 48109
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Abstract

A nicrofabricated silicon-based chemical gas sensor with a discontinuous film of Pt / TiOx, as the active sensing component has been characterized by atomic force microscopy, environmental scanning electron microscopy, and transmission electron microscopy. A study of the device's multilayer structure and of the thin sensing film is undertaken to understand and control the sensing properties of the metal / semiconducting materials. The purpose of this research is to advance the understanding of the conduction mechanism and provide a basis for optimizing the sensing properties and microstructure of the sensing device.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

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