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Characterization of Mocvd Grown Epitaxial Ceramic Oxide Thin Films

Published online by Cambridge University Press:  21 February 2011

J. C. Parker ,
H. L. M. Chang ,
J. J. Xu  and
D. J. Lam
J. C. Parker
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S. Cass Ave, Argonne, IL 60439
H. L. M. Chang
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S. Cass Ave, Argonne, IL 60439
J. J. Xu
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S. Cass Ave, Argonne, IL 60439
D. J. Lam
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S. Cass Ave, Argonne, IL 60439
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Abstract

Characterization of TiO2 films grown by the MOCVD technique was carried out using micro-Raman scattering. The effects of processing parameters on the film composition and morphology were investigated. The micro-Raman technique was shown to be a useful tool for characterizing oxide thin films grown by the MOCVD technique.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 337
Copyright
Copyright © Materials Research Society 1990

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References

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