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Characterization of Hydrocarbon Plasma used for a-C:H Deposition

Published online by Cambridge University Press:  28 February 2011

J. Wagner ,
Ch. Wild ,
A. Bubenzer  and
P. Koidl
J. Wagner
Affiliation:
Fraunhofer-Institut für Angewandte Festkörperphysik, Eckerstr.4, D-7800 Freiburg, Fed.Rep.Germany
Ch. Wild
Affiliation:
Fraunhofer-Institut für Angewandte Festkörperphysik, Eckerstr.4, D-7800 Freiburg, Fed.Rep.Germany
A. Bubenzer
Affiliation:
Fraunhofer-Institut für Angewandte Festkörperphysik, Eckerstr.4, D-7800 Freiburg, Fed.Rep.Germany
P. Koidl
Affiliation:
Fraunhofer-Institut für Angewandte Festkörperphysik, Eckerstr.4, D-7800 Freiburg, Fed.Rep.Germany
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Abstract

Optical emission analysis and mass spectroscopy was applied to study the rf-glow discharge in hydrocarbons used for the deposition of amorphous hydrogenated carbon (a-C:H).The mass spectra of the positively charged ions in the plasma are characteristic for the hydrocarbon used - e.g.benzene, hexane, or methane.In contrast, the properties of the deposited a-C:H film, such as refractive index, are independent of the precursor gas.Spatially resolved optical measurements show strong emission from C, C2, and CH in the vincinity of the negatively self-biased cathode (substrate) irrespective of the precursor used.Based on these findings we conclude that the fragmentation of the impinging energetic hydrocarbons is one of the key mechanisms for the formation of hard, strongly cross-linked a-C:H films.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 68: Symposium C – Plasma Processing , 1986 , 205
Copyright
Copyright © Materials Research Society 1986

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References

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