Hostname: page-component-77c89778f8-gq7q9 Total loading time: 0 Render date: 2024-07-16T14:15:16.531Z Has data issue: false hasContentIssue false
  • English
  • Français

Characterization of Ferroelectric Thin Films by ESCA

Published online by Cambridge University Press:  16 February 2011

Seshu B. Desu  and
Chi K. Kwok
Seshu B. Desu
Affiliation:
Department of Materials Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA 24061.
Chi K. Kwok
Affiliation:
Department of Materials Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA 24061.
Get access

Abstract

Electron spectroscopy for chemical analysis (ESCA) is well suited for investigating the surfaces of ferroelectric films. More importantly, this technique is valuable for ferroelectric films because, reduction of ions, such as Pb2+, Bi3+, and Ti4+ by photon beam is much less likely than probing electron and ion beams which are used in other methods. In the present paper a brief description of the possibilities of ESCA for determining qualitative and quantitative surface composition, and thickness of extremely thin films was presented. Special emphasis was given to multicomponent films, such as lead zirconate titanate (PZT). Factors that lead to considerable difference in the composition of the surface were discussed. Different depth profiling techniques using ESCA were also presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 200: Symposium Y – Ferroelectric Thin Films I , 1990 , 267
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1) Francombe, M. H., Thin Solid Films, 13,413 (1972).Google Scholar
2) Scott, J. F. et al., J.Appl.Phys., 64, 787 (1988).Google Scholar
3) Arlt, G., Hennigs, D. and With, G. de, J.Appl.Phys.., 58, 1619 (1985).Google Scholar
4) Kingery, W. D., Pure.Appl.Chem., 56, 1703 (1984).Google Scholar
5) Figueras, F., et al., Appl.Catal., 19, 21 (1985).Google Scholar
6) Kaldis, E. (ed.) “Crystal Growth of Electronic Materials,” North.Holland, NY (1985).Google Scholar
7) Standley, R. D. and Ramaswamy, U., J.Appl.Phys., 46, 4887 (1975).Google Scholar
8) Woodruff, D. P. and Delchar, T. A., ”Modern Techniques of Surface Science,” Cambridge University Press, Cambridge (1986).Google Scholar
9) Agar, A., ”Principles of Practice of Electron Microscope Operation,” Amsterdam (1974).Google Scholar
10) Muller, E. W., Z. Phsik., 131,136 (1951).Google Scholar
11) Engel, T. and Rieder, K. H. in Structural Studies of Surfaces, ed. by Hohler, G., Springer, Berlin, p 55, (1982).Google Scholar
12) Heiland, W. and Taglauer, E., Surf.Sci., 68, 96 (1977).Google Scholar
13) Clarke, L. J., ”Surface Crystallography, An Introduction to LEED,” John Wiley & sons, NY(1985).Google Scholar
14) Brundle, C. R., Surf.Sci., 48, 99 (1975).Google Scholar
15) Weissman, R. and Muller, K., Surf.Sci.Rep., 1,252 (1981).Google Scholar
16) Bann, W. C., Surf.Interface.Anal., 3, 243 (1981).Google Scholar
17) Somorajai, G. A., ”Chemistry in Two Dimensions,” Cornell University Press, NY (1981).Google Scholar
18) Briggs, D. and Seah, M. P., ”Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy,” John Wiley & Sons, NY (1983).Google Scholar
19) Stoneham, A. M., J.Am.Ceram.Soc., 64, 54 (1981).Google Scholar
20) Kwok, C. K., Desu, S. B., Kamnmerdiner, L., This volume.Google Scholar
21) Grundner, M., Proc.7th Intern.Vac.Congr. & 3rd Intern.Conf.Solid Surfaces, p 237, Vienna (1977).Google Scholar
22) Kwok, C. K. and Desu, S. B., The First International Ceramic Science & Technology Congress, Oct. 31-Nov. 3, (1989), Anaheim, CA, Abstract # 44-SXI-89C.Google Scholar