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C-Axis Oriented Ferroelectric thin Films of PbtiO3 on Silicon Substrate by Pulsed Laser Ablation

Published online by Cambridge University Press:  15 February 2011

V. R. Palkar
Affiliation:
Tata Institute of Fundamental Research, Colaba, Bombay 400-005, India.
S. C. Purandare
Affiliation:
Tata Institute of Fundamental Research, Colaba, Bombay 400-005, India.
S. P. Pai
Affiliation:
Tata Institute of Fundamental Research, Colaba, Bombay 400-005, India.
S. Chattopadhyay
Affiliation:
Tata Institute of Fundamental Research, Colaba, Bombay 400-005, India.
P. R. Apte
Affiliation:
Tata Institute of Fundamental Research, Colaba, Bombay 400-005, India.
R. Pinto
Affiliation:
Tata Institute of Fundamental Research, Colaba, Bombay 400-005, India.
M. S. Multani
Affiliation:
Tata Institute of Fundamental Research, Colaba, Bombay 400-005, India.
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Abstract

We are reporting the successful deposition of single phase c-axis oriented ferroelectric thin films of PbTiO3 on Si (100) by pulsed laser deposition. It is shown that the formation of non ferroelectric Pb2Ti2O6 phase at the interface could be avoided by raising the substrate temperature sufficiently high. The film deposition conditions are optimized so as to achieve better ferroelectric properties.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

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