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Carbon Implanted in Optical Grade Fused Silica: Annealing Effects in Reducing and Oxidizing Atmospheres

Published online by Cambridge University Press:  03 September 2012

Y. S. Tung ,
R. Mu ,
A. Ueda ,
D. O. Henderson ,
P. W. Wang ,
C. W. White ,
Jane G. Zhu  and
R. A. Zuhr
Y. S. Tung
Affiliation:
Chemical Physics Laboratory, Department of Physics, Fisk University, Nashville, TN
R. Mu
Affiliation:
Chemical Physics Laboratory, Department of Physics, Fisk University, Nashville, TN
A. Ueda
Affiliation:
Chemical Physics Laboratory, Department of Physics, Fisk University, Nashville, TN
D. O. Henderson
Affiliation:
Chemical Physics Laboratory, Department of Physics, Fisk University, Nashville, TN
P. W. Wang
Affiliation:
Department of Physics and Materials Research Institute, University of Texas at El Paso, El Paso, TX
C. W. White
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN
Jane G. Zhu
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN
R. A. Zuhr
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN
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Abstract

Carbon is implanted into fused silica with doses of 1, 3, 6, 10×1016 ions/cm2. Infrared spectroscopy has identified the formation of CO and CO2 molecules in the implanted glasses. The relationships among concentrations of carbon dioxide, carbon monoxide and carbon doses are established by the infrared measurements. Annealing under different atmospheres have dramatic effects on CO and CO2 concentrations.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 438: Symposium A – Materials Modificaton and Synthesis by Ion Beam… , 1996 , 447
Copyright
Copyright © Materials Research Society 1997

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