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Application of a Desk-Side Double-Axis X-Ray Diffractometer for Very Large Area Epilayer Characterization

Published online by Cambridge University Press:  22 February 2011

Neil Loxley ,
D. Keith Bowen  and
Brian K. Tanner
Neil Loxley
Affiliation:
Bede Scientific Instruments, Lindsey Park, Bowburn, Durham, DH6 5PF, UK
D. Keith Bowen
Affiliation:
Bede Scientific Instruments, Lindsey Park, Bowburn, Durham, DH6 5PF, UK
Brian K. Tanner
Affiliation:
Bede Scientific Instruments, Lindsey Park, Bowburn, Durham, DH6 5PF, UK
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Abstract

A new desk-side double-axis X-ray diffractometer capable of rapid, automatic measurement of lattice mismatch between epitaxial thin films and substrate in a two dimensional grid 150 mm square has been built. The design principles behind the five independent axis systems, specimen loading, and the fail-to-safety X-ray shutter are elucidated, and examples of typical data from substrate material and thin epitaxial films of III-V compounds are presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 208: Symposium J – Advances in Surface and Thin Film Diffraction , 1990 , 119
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

1. Tanner, B K J Electrochem. Soc. 136,3438 (1989)CrossRefGoogle Scholar
2. Tanner, B K J Crystal Growth 99, 1315 (1990)CrossRefGoogle Scholar
3. Bede Scientific Instruments, J Appl. Cryst. (1988)Google Scholar
4. Hart, M, in: Characterization of Crystal Growth Defects by X-ray Methods, eds. Tanner, B K and Bowen, D K 1980, Plenum, New York.Google Scholar
5. Tanner, B K, Chu, X and Bowen, D K, Mater Res. Soc. Symp. Proc. 69, 191 (1986)CrossRefGoogle Scholar