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An In-Situ Study of the Segregation and the Strain Relaxation During Growth of Gold and Nickel Ultrathin Films

Published online by Cambridge University Press:  10 February 2011

S. Labat
Affiliation:
MATOP UPRESA CNRS 6088, Faculté de St Jérôme 13397 Marseille, France.
P. Gergaud
Affiliation:
MATOP UPRESA CNRS 6088, Faculté de St Jérôme 13397 Marseille, France.
O. Thomas
Affiliation:
MATOP UPRESA CNRS 6088, Faculté de St Jérôme 13397 Marseille, France.
B. Gilles
Affiliation:
LTPCM UMR CNRS 5614, Domaine Universitaire de St Martin d'Hères, 38402 St Martin d'Hères, France.
A. Marty
Affiliation:
SP2M/DRFMC/CEA, Centre d'Etudes Nucléaires, 38054 Grenoble, France.
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Abstract

We report on in-situ real time measurement of both stress and strain during growth of ultrathin layers, with submonolayer sensitivity. The in-plane parameter is measured by Reflection High Energy Electron Diffraction (RHEED) and the stress is determined via the measurement of the curvature. The system studied is Au/Ni (i.e. Au on Ni and Ni on Au). We have evidenced a large asymmetry in the two different growths: Au (on Ni) shows a progressive elastic strain relaxation whereas Ni (on Au) exhibits a strong interplay between the stress and the interfacial mixing.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

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