Hostname: page-component-8448b6f56d-t5pn6 Total loading time: 0 Render date: 2024-04-20T00:37:13.063Z Has data issue: false hasContentIssue false
  • English
  • Français

An Image Analysis Technique For Assessing Particle Size And Agglomeration Tendency Of Slurries

Published online by Cambridge University Press:  14 March 2011

Susan R. Machinski ,
Kathleen A. Richardson  and
Aristide Dogariu
Susan R. Machinski
Affiliation:
Department of ChemistryCREOL University of Central Florida, 4000 Central Florida Boulevard Orlando, FL 32816 School of Optics, CREOL University of Central Florida, 4000 Central Florida Boulevard Orlando, FL 32816
Kathleen A. Richardson
Affiliation:
Department of ChemistryCREOL University of Central Florida, 4000 Central Florida Boulevard Orlando, FL 32816 School of Optics, CREOL University of Central Florida, 4000 Central Florida Boulevard Orlando, FL 32816
Aristide Dogariu
Affiliation:
School of Optics, CREOL University of Central Florida, 4000 Central Florida Boulevard Orlando, FL 32816
Get access

Abstract

Understanding the time-dependent behavior and size of particulate systems, specifically, particles in abrasive slurries, is a key part of chemical mechanical polishing (CMP). Microscopy and image analysis enables both qualitative and quantitative analysis of particle interaction behavior in diluted samples of such particulate suspensions. A technique using microscopy and image analysis has been developed specific to the analysis of suspensions of, micron size or larger, abrasive particle slurry systems. This technique has been applied to aluminum oxide (Al2O3) slurries and measurements of particle size and stability have been obtained with good accuracy and precision.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 613: Symposium E – Chemical-Mechanical Polishing 2000 - Fundamentals… , 2000 , E6.1.1
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Lauwidjaja, M., Characterization of the Stability of Aluminum Oxide (Al2O3) Slurries for Optical Polishing, M.S. thesis, Univ. of Central FL, 1998 Google Scholar
2. Pohl, M.C., Griffiths, D.A., J. Elect.Mater., 25, 1612 (1996z)10.1007/BF02655584Google Scholar
3. Bernhardt, C., Particle Size Analysis; Classification and Sedimentation Methods, (Chapman & Hall: London, 1994), p. 4 Google Scholar
4. Pohl, M.C., Griffiths, D.A., J. Elect. Mater., 25, 1612 (1996)10.1007/BF02655584Google Scholar
5. Media Cybernetics, 8484 Georgia Avenue, Suite 200, Silver Spring, MD 20910Google Scholar
6. Model 50, Denver Instr. Co., 6542 Fig St., Arvada, CO 80004Google Scholar
7. Catalog #13620181, Fisher ScientificGoogle Scholar
8. Southern Micro Instrumentations, 8250 Exchange Dr., Suite 110, Orlando, FL 32809Google Scholar
9. Model KP-D5OU, Nikon, 6420 Dobbin Rd., Suite E, Columbia, MD 21045Google Scholar
10. Catalog #5370A, Lot#17230, MSDS, Duke Scientific Corp., 2463 Faber Place, Paloi, CA 94303Google Scholar
11. BS Al2O3 Lot #910407, Product Code 9220, Norton Co. Materials, 1 New Bond Street, Worcester, MA 01615Google Scholar