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An Algorithm For Exhaustive Heteroepitaxial Substrate Searches

Published online by Cambridge University Press:  25 February 2011

Paul J. Shlichta*
Affiliation:
Crystal Research, 9112 Tucker Road SE, Olympia, WA 98503-8904, USA.
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Abstract

An algorithm has been discovered that greatly simplifies the exhaustive search for all orientations of all known crystals that have a lattice match with crystal film to be epitaxially deposited. It is based on the observations that (1) a two-dimensional lattice match of necessity entails an integer-ratio match between the areas of the unit parallelograms of the substrate and deposit planes and (2) that the unit area A (hkl) is equal to the unit cell volume divided by d(hkl). Using this algorithm, we are currently verifying the area-match tolerances for known cases of epitaxy and developing database-generating and searchprogram software.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

[1] For heteroepitaxial terminology, see: McPherson, A. and Shlichta, P. J., J. Crystal Growth,.5, 206 (1987), cf. pp. 212–13.Google Scholar
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