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Thermodynamic Constraints on Ion Beam Mixing of Metals on Insulators*

Published online by Cambridge University Press:  25 February 2011

G. C. Farlow
Affiliation:
Department of Chemical and Metalurgical Engineering, University of Tennessee, Knoxville, TN 37916
B. R. Appleton
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
L. A. Boatner
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
C. J. Mchargue
Affiliation:
Metals & Ceramics Division, ORNL
C. W. White
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
G. J. Clark
Affiliation:
IBM Research Labs, Yorktown Heights, NY 10598
J. E. E. Baglin
Affiliation:
IBM Research Labs, Yorktown Heights, NY 10598
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Abstract

Several different insulating substrates were coated with various metal films and ion beam irradiated using either Xe or Kr ions. These were then examined by Rutherford backscattering spectroscopy and scanning electron microscopy to determine if interfacial mixing had taken place. These results were compared with the sign of the reaction enthalpy of the metal and substrate to test the proposition that metals mix on insulators if the reaction enthalpy is negative and do not mix if it is positive. The enthalpy rule is in general valid. Two exceptions were found: Cr on Si02 and Zr on Al203; however, these exceptions contain ambiguous features.

Irradiation with a light, reactive ion was found to produce no mixing.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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Footnotes

*

Research sponsored by the Division of Materials Sciences, U.S. Department of Energy under contract DE-AC05-840R21400 with Martin Marietta Energy Systems, Inc.

References

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