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Thermal Stress-Induced Grain Boundary Voiding and Notching in Narrow Al-Based Metallizations

Published online by Cambridge University Press:  22 February 2011

Che-Yu Li
Affiliation:
Department of Materials Science and Engineering Cornell University, Ithaca, NY 14853
R. D. Black
Affiliation:
Department of Materials Science and Engineering Cornell University, Ithaca, NY 14853
W. R. LaFontaine
Affiliation:
Department of Materials Science and Engineering Cornell University, Ithaca, NY 14853
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Abstract

Grain boundary voiding has been identified as a diffusional creep mechanism that produces failure of narrow Al-based metallizations during thermal aging. It is considered to be a reliability concern for sub-micron metallizations because the resulting failure rate has been observed to be strongly line width dependent. This paper presents a theoretical model for stress-induced grain boundary voiding. The proposed model is shown to account for the experimentally observed temperature and time dependence of thermal aging-induced line failure data reported in the literature.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

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