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Tailoring the Work Function of Chalcopyrite Thin Films with Self-Assembled Monolayers of Thiols

Published online by Cambridge University Press:  01 February 2011

Sebastian Lehmann
Affiliation:
sebastian.lehmann@hmi.de, Hahn-Meitner Institut Berlin, Solar Energy Research, Glienicker Strasse 100, Berlin, 14109, Germany, +49-30-8062-2299, +49-30-8062-3199
David Fuertes Marrón
Affiliation:
sebastian.lehmann@hmi.de, Hahn-Meitner Institut Berlin, Solar Energy Research, Glienicker Strasse 100, Berlin, 14109, Germany
Marcus Bär
Affiliation:
baerm2@unlv.nevada.edu, University of Nevada, Department of Chemistry, 4505 Maryland Parkway, Box 454003, Las Vegas, NV, 89154-4003, United States
Iver Lauermann
Affiliation:
iver.lauermann@hmi.de, Hahn-Meitner Institut Berlin, Solar Energy Research, Glienicker Strasse 100, Berlin, 14109, Germany
Harry Mönig
Affiliation:
harry.moenig@hmi.de, Hahn-Meitner Institut Berlin, Solar Energy Research, Glienicker Strasse 100, Berlin, 14109, Germany
Martha Ch. Lux-Steiner
Affiliation:
lux-steiner@hmi.de, Hahn-Meitner Institut Berlin, Solar Energy Research, Glienicker Strasse 100, Berlin, 14109, Germany
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Abstract

Self-assembled monolayers of fluorinated thiols have been used as a means of surface conditioning to modify the work function of polycrystalline, wide-gap, chalcopyrite thin films. The molecular dipole, characteristic of such polar molecules, could be transferred to the surface of the semiconductor. Self-arrangement and orientation of the molecules upon adsorption ensured a net dipole contribution that was observed by means of ultra-violet photoemission spectroscopy. Such an approach offers a simple way for interface engineering, with a potential impact on the design of compound-specific band alignments of chalcopyrite-based devices. Molecular mechanics calculations of the expected molecular geometries complemented this work.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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